http://www.cnr.it/ontology/cnr/individuo/prodotto/ID52342
Simultaneous in situ AFM/EDXR techniques for thin films time-resolved morphological studies (Articolo in rivista)
- Type
- Label
- Simultaneous in situ AFM/EDXR techniques for thin films time-resolved morphological studies (Articolo in rivista) (literal)
- Anno
- 2009-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.cplett.2009.10.046 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Paci B. (a); Generosi A. (a); Generosi R. (a); Bailo D. (a,b); V. Rossi Albertini V. (a) (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
- http://dx.doi.org/10.1016/j.cplett.2009.10.046 (literal)
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- (a) Istituto di Struttura della Materia-C.N.R.;
(b) Dip.to di Chimica, Università 'La Sapienza', Roma, Italy (literal)
- Titolo
- Simultaneous in situ AFM/EDXR techniques for thin films time-resolved morphological studies (literal)
- Abstract
- The innovative potential of a non-commercial apparatus for simultaneous in situ Atomic Force Microscopy (AFM) and Energy Dispersive X-ray Reflectometry (EDXR) measurements is presented. A comparison between the two techniques, probing the samples surface in the direct and the reciprocal spaces, respectively, provides a deeper inspection in the surface morphology. Additionally, X-ray Reflectometry applied to films gives joint information on the surface and bulk morphology. The results on a gas sensing film demonstrate how simultaneous time-resolved AFM/EDXR allow the film surface/bulk morphology to be monitored, offering a unique tool to study the active materials in film-based technological devices in operating conditions. (literal)
- Prodotto di
- Autore CNR
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