Effect of oxygen partial pressure on PLD cobalt oxide films (Articolo in rivista)

Type
Label
  • Effect of oxygen partial pressure on PLD cobalt oxide films (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.apsusc.2008.02.055 (literal)
Alternative label
  • Laureti S., Agostinelli E., Scavia G., Varvaro G., Rossi Albertini, V., Generosi A., Paci B., Mezzi A., Kaciulis S. (2008)
    Effect of oxygen partial pressure on PLD cobalt oxide films
    in Applied surface science
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Laureti S., Agostinelli E., Scavia G., Varvaro G., Rossi Albertini, V., Generosi A., Paci B., Mezzi A., Kaciulis S. (literal)
Pagina inizio
  • 5111 (literal)
Pagina fine
  • 5115 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 254 (literal)
Rivista
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  • http://dx.doi.org/10.1016/j.apsusc.2008.02.055 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 5 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 16 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, ISM, Area Ric Roma1, I-00016 Rome, Italy CNR, ISM, I-00100 Rome, Italy CNR, ISMN, I-00016 Rome, Italy (literal)
Titolo
  • Effect of oxygen partial pressure on PLD cobalt oxide films (literal)
Abstract
  • Thin CoO oxide layers with superior properties in terms of crystallographic ordering, surface roughness and constant and controlled chemical compositions have been prepared by pulsed laser deposition in reactive O-2 atmosphere at 400 degrees C. Such systems are particularly suitable both for applications and for basic studies, any time high quality and controlled surfaces are required, for example in multilayered systems whose behaviour critically depends on interface properties, such as magnetically exchange-coupled systems. A structural and microstructural study of such films is presented, together with the compositional analysis for different process conditions. The best control on film stoichiometry was obtained by protecting the surface with a thin Pt cap-layer, before air exposure. (literal)
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