Carboxylic acid terminated monolayer formation on crystalline silicon and silicon nitride surfaces. A surface coverage determination with a fluorescent probe in solution (Articolo in rivista)

Type
Label
  • Carboxylic acid terminated monolayer formation on crystalline silicon and silicon nitride surfaces. A surface coverage determination with a fluorescent probe in solution (Articolo in rivista) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1039/b312273e (literal)
Alternative label
  • Cattaruzza F.a; Cricenti A.a; Flamini A.a; Girasole M.a; Longo G.a; Mezzi A.b; Prosperi T.a (2004)
    Carboxylic acid terminated monolayer formation on crystalline silicon and silicon nitride surfaces. A surface coverage determination with a fluorescent probe in solution
    in Journal of materials chemistry (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Cattaruzza F.a; Cricenti A.a; Flamini A.a; Girasole M.a; Longo G.a; Mezzi A.b; Prosperi T.a (literal)
Pagina inizio
  • 1461 (literal)
Pagina fine
  • 1468 (literal)
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  • 14 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 9 (literal)
Note
  • ISI Web of Science (WOS) (literal)
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  • a CNR, Istituto Struttura Materia, Area Ricerca Roma, I-00016 Rome, Italy; b CNR, Istituto Studio Materiali Nanostrutturati, Area Ricerca Roma, I-00016 Rome, Italy (literal)
Titolo
  • Carboxylic acid terminated monolayer formation on crystalline silicon and silicon nitride surfaces. A surface coverage determination with a fluorescent probe in solution (literal)
Abstract
  • Cited: 16 References: 26 Abstract: Carboxylic acid terminated (-COOH) monolayers (ML) have been covalently anchored on the surface (S) of crystalline silicon (Si) and silicon nitride (Si3N4) by using wet-chemistry methods. Their concentration has been determined adopting a stepwise procedure with a fluorescent probe in solution. First, 7-amino-4-methylcoumarin (H2N-C10H7O2, AMC) is covalently bonded to the monolayer on the surface through an amidation reaction forming an amide-terminated surface monolayer, S-(CH2)(n)-CO-NH-C10H7O2, then the surface is intensely washed in order to remove any physisorbed species, finally AMC is detached from the surface via hydrolysis of the -CO-NH- bond and quantified by a fluorescence analysis in water solution. The yields of both the amidation and hydrolysis reactions have been evaluated. By this method, submonolayers less than or equal to0.1 +/- 0.03 ML can be determined. It has been possible to evaluate the different extent of surface functionalization changing the substrate between Si and Si3N4 and for Si changing the monolayer fort-nation reaction: heat- (Delta) or light- (hv) promoted or via cathodic electrografting (CEG). It came out that submonolayers are formed in any case, Si3N4 is functionalized to a larger extent than Si on heating (0,52 vs. 0.15 ML) and Si is best functionalized via cathodic electrografting: Delta, 0.15; h), 0.20; CEG, 0.44 ML. Surface topography of some monolayers on Si and Si3N4 substrates was investigated by Atomic Force Microscopy (AFM). On clean Si, AFM showed topographical variations of 0.3-0.4 nm while for the clean Si3N4 the corrugation was around 3-4 nm. After functionalization the two surfaces were uniformly covered and the corrugation increased in both samples with a corrugation in topography of 1-2 am for Si and 5-6 nm for Si3N4 (literal)
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