H-Induced Dangling Bonds in H–Isoelectronic-Impurity Complexes Formed in GaAs(1-y)Ny Alloys (Articolo in rivista)

Type
Label
  • H-Induced Dangling Bonds in H–Isoelectronic-Impurity Complexes Formed in GaAs(1-y)Ny Alloys (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1103/PhysRevLett.98.206403 (literal)
Alternative label
  • Amore Bonapasta A., Filippone F., Mattioli G. (2007)
    H-Induced Dangling Bonds in H–Isoelectronic-Impurity Complexes Formed in GaAs(1-y)Ny Alloys
    in Physical review letters (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Amore Bonapasta A., Filippone F., Mattioli G. (literal)
Pagina inizio
  • 206403 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 98 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 4 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 20 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • ISM - CNR (literal)
Titolo
  • H-Induced Dangling Bonds in H–Isoelectronic-Impurity Complexes Formed in GaAs(1-y)Ny Alloys (literal)
Abstract
  • Complexes formed by H and the isoelectronic impurity N in GaAs1-yNy alloys have been widely investigated because the significant effects of N on the GaAs properties and their passivation by H represent a unique tool for a defect engineering of semiconductors. However, available results still present a quite puzzling picture. Both the N-H2* and C2v complexes proposed by theory were challenged indeed by experimental results. In the present Letter, we disclose a double-faced behavior of a H atom interacting with an isoelectronic impurity: while H, on one side, binds to N and induces the formation of dangling bonds (DB) on its Ga neighbors, on the other side, it saturates these DBs, thus permitting the formation of multiple-H complexes. This peculiar H behavior fully explains the experimental findings and likely represents a general feature of H–isoelectronic-impurity interactions. (literal)
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