Pulsed laser deposited hard TiC, ZrC, HfC and TaC films on titanium: hardness and an energy dispersive X-ray diffraction study. (Articolo in rivista)

Type
Label
  • Pulsed laser deposited hard TiC, ZrC, HfC and TaC films on titanium: hardness and an energy dispersive X-ray diffraction study. (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Alternative label
  • Ferro D., Rau J. V., Rossi Albertini V., Generosi A., Teghil R., Barinov S. M. (2008)
    Pulsed laser deposited hard TiC, ZrC, HfC and TaC films on titanium: hardness and an energy dispersive X-ray diffraction study.
    in Surface & coatings technology
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Ferro D., Rau J. V., Rossi Albertini V., Generosi A., Teghil R., Barinov S. M. (literal)
Pagina inizio
  • 1455 (literal)
Pagina fine
  • 1461 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 202 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • http://dx.doi.org/10.1016/j.surfcoat.2007.06.060 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • ISM - CNR ISMN - CNR Universitá della Basilicata, Potenza, Italy Institute for Physical Chemistry of Ceramics, Russian Academy of Sciences, Moscow, Russia (literal)
Titolo
  • Pulsed laser deposited hard TiC, ZrC, HfC and TaC films on titanium: hardness and an energy dispersive X-ray diffraction study. (literal)
Abstract
  • Thin films of TiC, ZrC, HfC and TaC were pulsed laser ablation deposited onto sandblasted pure titanium substrate at a laser beam fluence of 3 J/cm2. Deposition temperature was room temperature or 500 °C. The films were investigated by scanning electron microscopy, energy-dispersive X-ray diffraction (EDXD) and hardness measurements. The smooth and compact films of 200 to 600 nm thickness were obtained, consisting of tens nanometer particles. The rocking curve EDXD analysis revealed the films are textured. Intrinsic hardness of the films decreases generally with an increase in substrate temperature and in molecular weight of carbides. (literal)
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