AFM and SNOM characterization of carboxylic acid terminated silicon and silicon nitride surfaces (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• AFM and SNOM characterization of carboxylic acid terminated silicon and silicon nitride surfaces (Articolo in rivista) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Alternative label

• Cricenti A., Longo G., Luce M., Generosi R., Perfetti P., Vobornik D., Margaritondo G., Thielen P., Sanghera J. S., Aggarwal I. D., Miller J. K., Tolk N. H., Piston D. W., Cattaruzza F., Flamini A., Prosperi T., Mezzi A. (2003)
  AFM and SNOM characterization of carboxylic acid terminated silicon and silicon nitride surfaces
  in Surface science
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Cricenti A., Longo G., Luce M., Generosi R., Perfetti P., Vobornik D., Margaritondo G., Thielen P., Sanghera J. S., Aggarwal I. D., Miller J. K., Tolk N. H., Piston D. W., Cattaruzza F., Flamini A., Prosperi T., Mezzi A. (literal)

Pagina inizio

• 51 (literal)

Pagina fine

• 57 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 544 (literal)

Rivista

• Surface science (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Titolo

• AFM and SNOM characterization of carboxylic acid terminated silicon and silicon nitride surfaces (literal)

Abstract

• Silicon and Silicon Nitride Surfaces have been successfully terminated with Carboxylic Acid monolayers and investigated by Atomic Force Microscopy (AFM) and SNOM. On clean Si surface, AFM showed topographical variations of 0.3-0.4 nm while for the clean Si3N4 surface the corrugation was around 3-4 nm. After material deposition, the corrugation increased in both samples with a value in topography of 1-2 nm for Si and 5-6 nm for Si3N4 . The space distribution of specific chemical species was obtained by taking SNOM reflectivity at several infrared wavelengths corresponding to stretch absorption bands of the material. The SNOM images showed a constant contribution in the local reflectance, suggesting that the two surfaces were uniformly covered. (literal)

Prodotto di

• Institute of structure of matter (ISM) (Istituto)

Autore CNR

• MARCO LUCE (Persona)
• RENATO GENEROSI (Persona)
• TOMMASO PROSPERI (Unità di personale interno)
• PAOLO PERFETTI (Unità di personale interno)
• ANTONIO CRICENTI (Unità di personale interno)
• GIOVANNI LONGO (Persona)
• ALBERTO FLAMINI (Persona)
• FABRIZIO CATTARUZZA (Persona)

Incoming links:

Autore CNR di

• ANTONIO CRICENTI (Unità di personale interno)
• MARCO LUCE (Persona)
• PAOLO PERFETTI (Unità di personale interno)
• RENATO GENEROSI (Persona)
• ALBERTO FLAMINI (Persona)
• TOMMASO PROSPERI (Unità di personale interno)
• FABRIZIO CATTARUZZA (Persona)
• GIOVANNI LONGO (Persona)

Prodotto

• Institute of structure of matter (ISM) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Surface science (Rivista)