http://www.cnr.it/ontology/cnr/individuo/prodotto/ID48648
Oxide nanocrystal based nanocomposites for fabricating photoplastic AFM probes (Articolo in rivista)
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- Oxide nanocrystal based nanocomposites for fabricating photoplastic AFM probes (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1039/c1nr10487 (literal)
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Ingrosso, Chiara; Martin-Olmos, Cristina; Llobera, Andreu; Innocenti, Claudia; Sangregorio, Claudio; Striccoli, Marinella; Agostiano, Angela; Voigt, Anja; Gruetzner, Gabi; Brugger, Juergen; Perez-Murano, Francesc; Curri, Maria Lucia (2011)
Oxide nanocrystal based nanocomposites for fabricating photoplastic AFM probes
in Nanoscale (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Ingrosso, Chiara; Martin-Olmos, Cristina; Llobera, Andreu; Innocenti, Claudia; Sangregorio, Claudio; Striccoli, Marinella; Agostiano, Angela; Voigt, Anja; Gruetzner, Gabi; Brugger, Juergen; Perez-Murano, Francesc; Curri, Maria Lucia (literal)
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- Rivista pubblicata anche in ed. online (ISSN 2040-3372) (literal)
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- http://pubs.rsc.org/en/Content/ArticleLanding/2011/NR/c1nr10487j#!divAbstract (literal)
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- 10.1039/c1nr10487 (literal)
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- [Ingrosso, Chiara; Striccoli, Marinella; Agostiano, Angela; Curri, Maria Lucia] Univ Bari, Dipartimento Chim, CNR, IPCF,Sez Bari, I-70126 Bari, Italy .
[Martin-Olmos, Cristina; Llobera, Andreu; Perez-Murano, Francesc] CSIC, CNM, IMB, Bellaterra 08193, Spain .
[Martin-Olmos, Cristina; Brugger, Juergenl Ecole Polytech Fed Lausanne, Microsyst Lab, CH-1015 Lausanne, Switzerland .
[Sangregorio, Claudio] Univ Florence, Dipartimento Chim, I-50019 Sesto Fiorentino, Italy; ISTM, CNR, I-20133 Milan, Italy .
[Voigt, Anja; Gruetzner, Gabi] Micro Resist Technol GmbH, D-12555 Berlin, Germany. (literal)
- Titolo
- Oxide nanocrystal based nanocomposites for fabricating photoplastic AFM probes (literal)
- Abstract
- We report on the synthesis, characterization and application of a novel nanocomposite made of a negative tone epoxy based photoresist modified with organic-capped Fe(2)O(3) nanocrystals (NCs). The mechanical properties of the nanocomposite drastically improve upon incorporation of a suitable concentration of NCs in the polymer, without deteriorating its photolithography performance. High aspect ratio 3D microstructures made of the nanocomposite have been fabricated with a uniform surface morphology and with a resolution down to few micrometres. The embedded organic-capped Fe(2)O(3) NCs drastically increase the stiffness and hardness of the epoxy based photoresist matrix, making the final material extremely interesting for manufacturing miniaturized polymer based mechanical devices and systems. In particular, the nanocomposite has been used as structural material for fabricating photoplastic Atomic Force Microscopy (AFM) probes with integrated tips showing outstanding mechanical response and high resolution imaging performance. The fabricated probes consist of straight cantilevers with low stress-gradient and high quality factors, incorporating sharp polymeric tips. They present considerably improved performance compared to pure epoxy based photoresist AFM probes, and to commercial silicon AFM probes. (literal)
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