CVD of Copper Oxides from a beta-Diketonate Diamine Precursor: Tailoring the Nano-Organization (Articolo in rivista)

Type
Label
  • CVD of Copper Oxides from a beta-Diketonate Diamine Precursor: Tailoring the Nano-Organization (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1021/cg801378x (literal)
Alternative label
  • Barreca D.; Gasparotto A.; Maccato C.; Tondello E.; Lebedev O. I.; Van Tendeloo G. (2009)
    CVD of Copper Oxides from a beta-Diketonate Diamine Precursor: Tailoring the Nano-Organization
    in Crystal growth & design
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Barreca D.; Gasparotto A.; Maccato C.; Tondello E.; Lebedev O. I.; Van Tendeloo G. (literal)
Pagina inizio
  • 2470 (literal)
Pagina fine
  • 2480 (literal)
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  • articolo con autori stranieri (literal)
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  • http://pubs.acs.org/doi/abs/10.1021/cg801378x (literal)
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  • 9 (literal)
Rivista
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  • DOI: 10.1021/cg801378x (literal)
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  • 11 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
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  • 1 - ISTM-CNR and INSTM, Department of Chemistry, Padova University, Via Marzolo, 1, 35131 Padova, Italy / 2,3,4 - Department of Chemistry, Padova University and INSTM, Via Marzolo, 1, 35131 Padova, Italy / 5,6 - Electron Microscopy for Materials Science (EMAT), University of Antwerp, Groenenborgerlaan, 171, B2020 Antwerpen, Belgium (literal)
Titolo
  • CVD of Copper Oxides from a beta-Diketonate Diamine Precursor: Tailoring the Nano-Organization (literal)
Abstract
  • A copper(II) hexafluoroacetylacetonate (1,1,1,5,5,5-hexafluoro-2,4-pentanedionate, hfa) adduct with N,N,N',N'- tetramethylethylenediamine (TMEDA) [Cu(hfa)2 .TMEDA] is used for the first time as precursor for the chemical vapor deposition (CVD) of copper oxide nanosystems. The syntheses are carried out under both O2 and O2+H2O reaction atmospheres on Si(100) substrates, at temperatures ranging between 250 and 550 °C. Subsequently, the interrelations between the preparative conditions and the system composition, nanostructure, and morphology are elucidated by means of complementary analytical techniques [Fourier transform infrared spectroscopy (FT-IR), X-ray photoelectron and X-ray excited auger electron spectroscopies (XPS and XE-AES), glancing incidence X-ray diffraction (GIXRD), field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM)]. The obtained data revealed a gradual transformation from Cu2O, to Cu2O + CuO, to CuO nanosystems upon increasing the deposition temperature from 250 to 550 °C under both growth atmospheres. Such a phenomenon was accompanied by a progressive morphological evolution from continuous films to 1D hyperbranched nanostructures. Water vapor introduction in the deposition environment enabled to lower the deposition temperature and resulted in a higher aggregate interconnection, attributed to a higher density of nucleation centers. (literal)
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