Novel Gallium Complexes with Malonic Diester Anions as Molecular Precursors for the MOCVD of Ga2O3 Thin Films (Articolo in rivista)

Type
Label
  • Novel Gallium Complexes with Malonic Diester Anions as Molecular Precursors for the MOCVD of Ga2O3 Thin Films (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Alternative label
  • M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, M. Winter, E. Tondello, R.A. Fischer, A. Devi (2009)
    Novel Gallium Complexes with Malonic Diester Anions as Molecular Precursors for the MOCVD of Ga2O3 Thin Films
    in European journal of inorganic chemistry (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, M. Winter, E. Tondello, R.A. Fischer, A. Devi (literal)
Pagina inizio
  • 1110 (literal)
Pagina fine
  • 1117 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • DOI: 10.1002/ejic.200801062 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 8 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1,2,5,7,8: Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-Universität Bochum, 44780 Bochum, Germany 3: ISTM-CNR and INSTM - Department of Chemistry, Padova University, 35131 Padova, Italy 4,6: Department of Chemistry - Padova University and INSTM, 35131 Padova, Italy (literal)
Titolo
  • Novel Gallium Complexes with Malonic Diester Anions as Molecular Precursors for the MOCVD of Ga2O3 Thin Films (literal)
Abstract
  • Five different homoleptic gallium complexes with malonic diester anions [Ga(ROCOCHOCOR)3] [R =Me (1), Et (2), iPr (3), tBu (4) and SiMe3 (5)] have been synthesised and characterised by 1H and 13C NMR, IR spectroscopy, electron ionisation mass spectrometry (EI-MS), and single-crystal X-ray diffraction. The thermal properties of the obtained compounds were evaluated by thermogravimetric studies to assess their suitability as precursors for the metal-organic chemical vapour deposition (MOCVD) of Ga2O3 thin films. MOCVD of Ga2O3 thin films was carried out starting from compound 2 in light of the promising features of this precursor. The as-deposited layers are amorphous and can be transformed into the monoclinic ²-Ga2O3 phase upon annealing at 1000 °C ex situ. The film morphology was studied by scanning electron microscopy (SEM), and its composition was investigated by energy-dispersive X-ray spectroscopy (EDXS) and X-ray photoelectron spectroscopy (XPS). Almost stoichiometric Ga2O3 thin films with low levels of carbon incorporation were obtained. (literal)
Prodotto di
Autore CNR
Insieme di parole chiave

Incoming links:


Prodotto
Autore CNR di
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
Insieme di parole chiave di
data.CNR.it