Metal oxoclusters as molecular building blocks for the development of nanostructured inorganic-organic hybrid thin films (Articolo in rivista)

Type
Label
  • Metal oxoclusters as molecular building blocks for the development of nanostructured inorganic-organic hybrid thin films (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1007/s00706-006-0444-x (literal)
Alternative label
  • Gross S., Zattin A., Di Noto V., Lavina S. (2006)
    Metal oxoclusters as molecular building blocks for the development of nanostructured inorganic-organic hybrid thin films
    in Monatshefte für Chemie
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Gross S., Zattin A., Di Noto V., Lavina S. (literal)
Pagina inizio
  • 583 (literal)
Pagina fine
  • 593 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 137 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 11 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 5 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Padua, Dept Chem, CNR, ISTM, I-35131 Padua, Italy Univ Padua, Dept Chem, Padua, Italy (literal)
Titolo
  • Metal oxoclusters as molecular building blocks for the development of nanostructured inorganic-organic hybrid thin films (literal)
Abstract
  • Silica-based inorganic-organic hybrid thin films embedding the organically modified oxohafnium clusters (Hf4O2(OMc)(12), OMc=OC(O)-C(CH3)=CH2) were obtained by photo-activated free radical copolymerisation of the methacrylate groups of the cluster with those of the pre-hydrolysed (methacryloxypropyl)trimethoxysilane (MAPTMS, (CH2=C(CH3)C(O)O)(CH2)(3)Si(OCH3)(3)). By this route, a covalent anchoring of the cluster to the forming silica network was achieved. Samples characterized by two different Si/Hf compositions (18:1, 5:1) were prepared. The surface and in-depth composition of the thin films were investigated through Fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). XPS depth profiles performed on the thin layers evidenced a homogenous in depth distribution of the hafnium guest species within the whole silica films and sharp film-substrate interfaces. (literal)
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