Influence of the electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and ruo2 nanocrystalline films (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Influence of the electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and ruo2 nanocrystalline films (Articolo in rivista) (literal)

Anno

• 2002-01-01T00:00:00+01:00 (literal)

Alternative label

• Barison S., Barreca D., Daolio S., Fabrizio M., Tondello E. (2002)
  Influence of the electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and ruo2 nanocrystalline films
  in Journal of materials chemistry (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Barison S., Barreca D., Daolio S., Fabrizio M., Tondello E. (literal)

Pagina inizio

• 1511 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 12 (literal)

Rivista

• Journal of materials chemistry (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Titolo

• Influence of the electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and ruo2 nanocrystalline films (literal)

Prodotto di

• Institute of molecular science and technologies (ISTM) (Istituto)

Incoming links:

Prodotto

• Institute of molecular science and technologies (ISTM) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of materials chemistry (Rivista)