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OXIDATION OF NONIONIC SURFACTANTS BY FENTON AND H2O2/UV PROCESSES (Articolo in rivista)
- Type
- Label
- OXIDATION OF NONIONIC SURFACTANTS BY FENTON AND H2O2/UV PROCESSES (Articolo in rivista) (literal)
- Anno
- 2008-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1080/09593330801983862 (literal)
- Alternative label
PAGANO M., LOPEZ A., VOLPE A., MASCOLO G., CIANNARELLA R. (2008)
OXIDATION OF NONIONIC SURFACTANTS BY FENTON AND H2O2/UV PROCESSES
in Environmental technology
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- PAGANO M., LOPEZ A., VOLPE A., MASCOLO G., CIANNARELLA R. (literal)
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- ISI Web of Science (WOS) (literal)
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- PAGANO M.: Consiglio Nazionale delle Ricerche, Istituto di Ricerca Sulle Acque - Sezione di Bari - Via Francesco De Blasio, 5 - 70123 Bari, Italy
LOPEZ A.: Consiglio Nazionale delle Ricerche, Istituto di Ricerca Sulle Acque - Sezione di Bari - Via Francesco De Blasio, 5 - 70123 Bari, Italy
VOLPE A.: Consiglio Nazionale delle Ricerche, Istituto di Ricerca Sulle Acque - Sezione di Bari - Via Francesco De Blasio, 5 - 70123 Bari, Italy
MASCOLO G.: Consiglio Nazionale delle Ricerche, Istituto di Ricerca Sulle Acque - Sezione di Bari - Via Francesco De Blasio, 5 - 70123 Bari, Italy
CIANNARELLA R.: Consiglio Nazionale delle Ricerche, Istituto di Ricerca Sulle Acque - Sezione di Bari - Via Francesco De Blasio, 5 - 70123 Bari, Italy (literal)
- Titolo
- OXIDATION OF NONIONIC SURFACTANTS BY FENTON AND H2O2/UV PROCESSES (literal)
- Abstract
- The oxidation of 10 nonionic surfactants (6 alcohol ethoxylates and 4 alkylphenol ethoxylates) by Fenton and H2O2/UV
processes was investigated in synthetic (deionized water) and real aqueous matrices, i.e. secondary effluent from municipal wastewater treatment plant and groundwater. Batch tests were carried out to assess the optimal dosages of
reagents leading to the total removal of surfactants. Regardless to the specific surfactant, both Fenton and H2O2/UV treatments of synthetic solutions containing one single surfactant (C0=14 mg l-1) always caused its rapid and quantitative removal (96-99%) with a corresponding very low (0-18%) TOC decrease. Only for the Fenton treatment, linear relationships were found between the amounts of H2O2 and Fe2+ necessary for surfactant removal and the ethoxy chain length of each surfactant. Conversely, in the case of H2O2/UV treatment the H2O2 dosage causing the quantitative oxidation of the treated surfactant depended on the length of both chains: the ethoxy and the hydrophobic one. Mixtures of the 10 surfactants (1.4 mg l-1 each) were treated in both synthetic and real matrices. These latter were
different in the case of Fenton (i.e. municipal secondary effluent) or H2O2/UV (i.e. real groundwater) treatments.
Fenton treatment of municipal secondary effluent containing the surfactants mixture led to its total removal when a molar ratio [Total surfactants]/[H2O2]/[Fe2+] equal to 1/17/12 was used. As for H2O2/UV treatment of real groundwater
samples, quantitative removal of surfactants mixture was achieved with a molar ratio [Total surfactants]/ [H2O2] equal to 1/7.4. Surfactants mixture removals, if compared in deionized water and in real matrices, showed the same matrix effect during both treatments, i.e. less amounts of reagents were always required in synthetic solutions. (literal)
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