Kinetic growth mechanisms of sputter-deposited Au films on mica: from nanoclusters to nanostructured microclusters (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Kinetic growth mechanisms of sputter-deposited Au films on mica: from nanoclusters to nanostructured microclusters (Articolo in rivista) (literal)

Anno

• 2010-01-01T00:00:00+01:00 (literal)

Alternative label

• Ruffino F, Torrisi V, Marletta G, Grimaldi MG (2010)
  Kinetic growth mechanisms of sputter-deposited Au films on mica: from nanoclusters to nanostructured microclusters
  in Applied physics. A, Materials science & processing (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Ruffino F, Torrisi V, Marletta G, Grimaldi MG (literal)

Pagina inizio

• 7 (literal)

Pagina fine

• 13 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 100 (literal)

Rivista

• Applied physics. A, Materials science & processing (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• 1. Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania, Italy 2. CNR-IMM MATIS, via S. Sofia 64, 95123 Catania, Italy 3. Laboratory for Molecular Surface and Nanotechnology (LAMSUN), Department of Chemical Sciences, University of Catania and CSGI, Viale A. Doria 6, 95125 Catania, Italy (literal)

Titolo

• Kinetic growth mechanisms of sputter-deposited Au films on mica: from nanoclusters to nanostructured microclusters (literal)

Abstract

• Au nanostructured film was deposited on mica by room temperature RF sputtering. The growth mechanism of the film was studied analyzing the evolution of the film morphology as a function of its thickness by the atomic forcemicroscopy. In the early stages of a growth the film evolution proceeds by the nucleation and growth of nanoclusters. After a critical thickness the growth of microclusters formed by the joining of nanoclusters in preferential nucleation sites, onto a quasicontinuous film, is observed. We quantified the evolution of the mean nanoclusters height and surface density and of the film roughness. This data were analyzed by the dynamic scaling theory of growing interfaces obtaining the scaling and roughness exponents z and ² whose values suggest a conservative growth process. We also quantified the growth of the microclusters showing that it is consistent with a coalescence/impingement dynamic. About the formation of the microclusters, furthermore, we speculate that their origin is strongly correlated to the features of the sputtering technique in connection with the deposition on a high-diffusivity substrate. (literal)

Prodotto di

• MD.P05.006.001 Controllo su scala atomica dei materiali per dispositivi innovativi elettronici e fotonici basati su silicio. (MD.P05.006.002) (Modulo)
• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• FRANCESCO RUFFINO (Persona)
• MARIA GRAZIA GRIMALDI (Persona)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• MD.P05.006.001 Controllo su scala atomica dei materiali per dispositivi innovativi elettronici e fotonici basati su silicio. (MD.P05.006.002) (Modulo)

Autore CNR di

• MARIA GRAZIA GRIMALDI (Persona)
• FRANCESCO RUFFINO (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Applied physics. A, Materials science & processing (Rivista)