Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time (Articolo in rivista) (literal)

Anno

• 2010-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1063/1.3428467 (literal)

Alternative label

• Ruffino F, Grimaldi MG (2010)
  Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time
  in Journal of applied physics
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Ruffino F, Grimaldi MG (literal)

Pagina inizio

• 104321 (literal)

Pagina fine

• 104321 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 107 (literal)

Rivista

• Journal of applied physics (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania, Italy and CNR-IMM MATIS, via S. Sofia 64, 95123 Catania, Italy (literal)

Titolo

• Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time (literal)

Abstract

• Nanostructured Au films were deposited on Si(111) by room-temperature sputtering. By the atomic force microscopy technique we studied the evolution of the Au film morphology as a function of the film thickness h and annealing time t at 873 K. By the study of the evolution of the mean vertical and horizontal sizes of the islands forming the film and of their fraction of covered area as a function of h from 1.7x1017 to 1.0x1018 Au/cm2 we identified four different growth stages such as: (1) 1.7x1017

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)
• MD.P05.006.001 Controllo su scala atomica dei materiali per dispositivi innovativi elettronici e fotonici basati su silicio. (MD.P05.006.002) (Modulo)

Autore CNR

• MARIA GRAZIA GRIMALDI (Persona)
• FRANCESCO RUFFINO (Persona)

Insieme di parole chiave

• Parole chiave di "Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time" (Insieme di parole chiave)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• MD.P05.006.001 Controllo su scala atomica dei materiali per dispositivi innovativi elettronici e fotonici basati su silicio. (MD.P05.006.002) (Modulo)

Autore CNR di

• MARIA GRAZIA GRIMALDI (Persona)
• FRANCESCO RUFFINO (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of applied physics (Rivista)

Insieme di parole chiave di

• Parole chiave di "Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time" (Insieme di parole chiave)