Electrical and optical properties of ITO and ITO/Cr-doped ITO films (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Electrical and optical properties of ITO and ITO/Cr-doped ITO films (Articolo in rivista) (literal)

Anno

• 2010-01-01T00:00:00+01:00 (literal)

Alternative label

• Caricato AP, Cesaria M, Luches A, Martino M, Maruccio G, Valerini D, Catalano M, Cola A, Manera MG, Lomascolo M, Taurino A, Rella R (2010)
  Electrical and optical properties of ITO and ITO/Cr-doped ITO films
  in Applied physics. A, Materials science & processing (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Caricato AP, Cesaria M, Luches A, Martino M, Maruccio G, Valerini D, Catalano M, Cola A, Manera MG, Lomascolo M, Taurino A, Rella R (literal)

Pagina inizio

• 753 (literal)

Pagina fine

• 758 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 101 (literal)

Rivista

• Applied physics. A, Materials science & processing (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• 1. Univ Salento, Dept Phys, I-73100 Lecce, Italy 2. Univ Salento, Scuola Super Isufi, I-73100 Lecce, Italy 3. IMM CNR, Inst Microelect & Microsyst, I-73100 Lecce, Italy (literal)

Titolo

• Electrical and optical properties of ITO and ITO/Cr-doped ITO films (literal)

Abstract

• In this paper we report on the effects of the insertion of Cr atoms on the electrical and optical properties of indium tin oxide (ITO) films to be used as electrodes in spinpolarized light-emitting devices. ITO films and ITO(80 nm)/Cr-doped ITO(20 nm) bilayers and Cr-doped ITO films with a thickness of 20 nm were grown by pulsed ArF excimer laser deposition. The optical, structural, morphological wand electrical properties of ITO films and ITO/Cr-doped structures were characterized by UV-Visible transmission and reflection spectroscopy, transmission electron microscopy (TEM), atomic force microscopy (AFM) and Hall-effect analysis. For the different investigations, the samples were deposited on different substrates like silica and carbon coated Cu grids. ITO films with a thickness of 100 nm, a resistivity as low as similar to 4 x 10(-4) Omega cm, an energy gap of similar to 4.3 eV and an atomic scale roughness were deposited at room temperature without any post-deposition process. The insertion of Cr into the ITO matrix in the upper 20 nm of the ITO matrix induced variations in the physical properties of the structure like an increase of average roughness (similar to 0.4-0.5 nm) and resistivity (up to similar to 8x10(-4) Omega cm). These variations were correlated to the microstructure of the Cr-doped ITO films with particular attention to the upper 20 nm. (literal)

Prodotto di

• Sensori e Microsistemi Intelligenti per la Sicurezza e la Qualità della vita nei settori Agroalimentare, Trasporti ed \"Ambient Assisted Living\" (MD.P05.010.001) (Modulo)
• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• ADRIANO COLA (Unità di personale interno)
• ROBERTO RELLA (Unità di personale interno)
• ANTONIETTA TAURINO (Unità di personale interno)
• MASSIMO CATALANO (Persona)
• MARIA GRAZIA MANERA (Persona)
• MAURO LOMASCOLO (Persona)

Incoming links:

Autore CNR di

• MASSIMO CATALANO (Persona)
• MAURO LOMASCOLO (Persona)
• ROBERTO RELLA (Unità di personale interno)
• ADRIANO COLA (Unità di personale interno)
• ANTONIETTA TAURINO (Unità di personale interno)
• MARIA GRAZIA MANERA (Persona)

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Sensori e Microsistemi Intelligenti per la Sicurezza e la Qualità della vita nei settori Agroalimentare, Trasporti ed \"Ambient Assisted Living\" (MD.P05.010.001) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Applied physics. A, Materials science & processing (Rivista)