Simulation of damage induced by ion implantation in Lithium Niobate (Articolo in rivista)

Type
Label
  • Simulation of damage induced by ion implantation in Lithium Niobate (Articolo in rivista) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Alternative label
  • Bianconi M, Bentini GG, Chiarini M, De Nicola P, Montanari GB, Menin A, Nubile A, Sugliani S (2010)
    Simulation of damage induced by ion implantation in Lithium Niobate
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Bianconi M, Bentini GG, Chiarini M, De Nicola P, Montanari GB, Menin A, Nubile A, Sugliani S (literal)
Pagina inizio
  • 3452 (literal)
Pagina fine
  • 3457 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 268 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1. CNR, IMM, I-40129 Bologna, Italy 2. Lab Micro & Submicro Tecnol Abilitanti Emilia Rom, I-40129 Bologna, Italy 3. Carlo Gavazzi Space SpA, Sede Bologna, I-40129 Bologna, Italy 4. Univ Bologna, Dipartimento DEIS, I-40136 Bologna, Italy (literal)
Titolo
  • Simulation of damage induced by ion implantation in Lithium Niobate (literal)
Abstract
  • A simulation tool has been developed to engineer the damage formation in Lithium Niobate by ion irradiation with any atomic number and energy Both nuclear and electronic processes were considered and in particular the dependence on the ion velocity of the electronic excitation damage efficiency has been taken into account By using this tool It is possible both to draw damage nomograms useful to qualitatively foresee the result of a given process and to perform reliable simulations of the defect depth profiles as demonstrated by the good agreement with the experimental data available in the literature. (literal)
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