http://www.cnr.it/ontology/cnr/individuo/prodotto/ID36617
Synthesis of crystalline Si quantum dots by millisecond laser irradiation of SiOxNy layers (Articolo in rivista)
- Type
- Label
- Synthesis of crystalline Si quantum dots by millisecond laser irradiation of SiOxNy layers (Articolo in rivista) (literal)
- Anno
- 2010-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.3282660 (literal)
- Alternative label
Mannino G, Spinella C, Bongiorno C, Nicotra G, Mercorillo F, Privitera V, Franzo G, Piro AM, Grimaldi M, Di Stefano MA, Di Marco S (2010)
Synthesis of crystalline Si quantum dots by millisecond laser irradiation of SiOxNy layers
in Journal of applied physics; AIP, American institute of physics, Melville, NY (Stati Uniti d'America)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Mannino G, Spinella C, Bongiorno C, Nicotra G, Mercorillo F, Privitera V, Franzo G, Piro AM, Grimaldi M, Di Stefano MA, Di Marco S (literal)
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- http://jap.aip.org/resource/1/japiau/v107/i2/p023703_s1?isAuthorized=no (literal)
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- 1. IMM, CNR, I-95121 Catania, Italy
2. INFM, CNR, I-95124 Catania, Italy
3. STMicroelectronics, I-95121 Catania, Italy (literal)
- Titolo
- Synthesis of crystalline Si quantum dots by millisecond laser irradiation of SiOxNy layers (literal)
- Abstract
- We demonstrated that the timescale for Si quantum dot (Si-QD) formation in a SiOxNy layer is a few milliseconds by IR laser irradiation. The amount of Si agglomerated into QD in a laser irradiated SiOxNy layer is comparable to that calculated after furnace annealing at 1250 degrees C for 30 min. However, we found that crystalline Si-QD can be formed by laser only if the amount of Si atoms in excess is as high as 1x10(22)/cm(3). The Si-QD contains impurities like N and O that prevent luminescence at 900 nm. The photoluminescence (PL) signal is recorded only after an additional annealing after laser irradiation at temperatures above 1000 degrees C when diffusion-assisted replacement of N and O occurs. (literal)
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