The effects of the focus ion beam milling process on the optical properties of semiconductor nanostructures (Articolo in rivista)

Type
Label
  • The effects of the focus ion beam milling process on the optical properties of semiconductor nanostructures (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Alternative label
  • Bellini E, Taurino A, Catalano M, Lomascolo M, Passaseo A, Vasanelli L (2009)
    The effects of the focus ion beam milling process on the optical properties of semiconductor nanostructures
    in Nanotechnology (Bristol. Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Bellini E, Taurino A, Catalano M, Lomascolo M, Passaseo A, Vasanelli L (literal)
Pagina inizio
  • 255306 (literal)
Pagina fine
  • 255306 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 20 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1. Univ Salento, Dipartimento Ingn Innovaz, I-73100 Lecce, Italy 2. CNR, Italian Natl Res Council, Inst Microelect & Microsyst, Lecce Sect, I-73100 Lecce, Italy (literal)
Titolo
  • The effects of the focus ion beam milling process on the optical properties of semiconductor nanostructures (literal)
Abstract
  • In this work, the effects of the focus ion beam (FIB) milling process on the optical properties of semiconductor nanostructures were investigated. With this aim, a sensitive materials system based on InGaAs/GaAs quantum dots with well known and excellent optical properties was selected for the FIB treatment. The FIB technique was used to locally remove a metallic mask deposited on top of the quantum dot sample. The photoluminescence (PL) signal, collected from the circular openings, was used to infer the possible damage effects of the ion beam on the properties of the dots. (literal)
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