Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories (Articolo in rivista)

Type
Label
  • Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Alternative label
  • Molas G, Bocquet M, Buckley J, Grampeix H, Gely M, Colonna JP, Martin F, Brianceau P, Vidal V, Bongiorno C, Lombardo S, Pananakakis G, Ghibaudo G, De Salvo B, Deleonibus S (2008)
    Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories
    in Microelectronic engineering
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Molas G, Bocquet M, Buckley J, Grampeix H, Gely M, Colonna JP, Martin F, Brianceau P, Vidal V, Bongiorno C, Lombardo S, Pananakakis G, Ghibaudo G, De Salvo B, Deleonibus S (literal)
Pagina inizio
  • 2393 (literal)
Pagina fine
  • 2399 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 85 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Titolo
  • Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories (literal)
Prodotto di
Autore CNR

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