Two-dimensional electron gas insulation by local surface thin thermal oxidation in AlGaN/GaN heterostructures (Articolo in rivista)

Type
Label
  • Two-dimensional electron gas insulation by local surface thin thermal oxidation in AlGaN/GaN heterostructures (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2946657 (literal)
Alternative label
  • Roccaforte F, Giannazzo F, Iucolano F, Bongiorno C, Raineri V (2008)
    Two-dimensional electron gas insulation by local surface thin thermal oxidation in AlGaN/GaN heterostructures
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Roccaforte F, Giannazzo F, Iucolano F, Bongiorno C, Raineri V (literal)
Pagina inizio
  • 252101 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 92 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [Roccaforte, Fabrizio; Giannazzo, Filippo; Iucolano, Ferdinando; Bongiorno, Corrado; Raineri, Vito] CNR, IMM, I-95121 Catania, Italy; [Iucolano, Ferdinando] Catania Univ, Dipartimento Fis & Astron, I-95123 Catania, Italy (literal)
Titolo
  • Two-dimensional electron gas insulation by local surface thin thermal oxidation in AlGaN/GaN heterostructures (literal)
Abstract
  • In this letter, the physical effects of the local surface thin thermal oxidation on the current transport in AlGaN/GaN heterostructures are reported. Current-voltage measurements performed on appropriate test patterns demonstrated that a selective oxidation process at 900 degrees C enables the suppression of the current flow through the two-dimensional electron gas. The electrical insulation was achieved even though structural analysis showed that the formed oxide did not reach the depth of the AlGaN/GaN heterointerface. The combination of capacitance-voltage measurements with depth-resolved scanning capacitance microscopy enabled to correlate the electrical results to the doping and the compositional stability of the material during oxidation. (c) 2008 American Institute of Physics. (literal)
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