The influence of oxygen on the optical properties of RF-sputtered zinc oxide thin films (Articolo in rivista)

Type
Label
  • The influence of oxygen on the optical properties of RF-sputtered zinc oxide thin films (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • Gioffre M, Angeloni M, Gagliardi M, Iodice M, Coppola G, Aruta C, Della Corte FG (2007)
    The influence of oxygen on the optical properties of RF-sputtered zinc oxide thin films
    in Superlattices and microstructures
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Gioffre M, Angeloni M, Gagliardi M, Iodice M, Coppola G, Aruta C, Della Corte FG (literal)
Pagina inizio
  • 85 (literal)
Pagina fine
  • 88 (literal)
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  • 42 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Istituto per la Microelettronica e Microsistemi - Consiglio Nazionale delle Ricerche - Napoli, via P. Castellino 111 - 80131, Napoli, Italy Università \"Mediterranea” di Reggio Calabria - Facoltà di Ingegneria - ReggioCalabria, Feo di Vito - 89060 Reggio Calabria, Italy Coherentia CNR - INFM, Dip. Ing. Meccanica - Università di Roma “TorVergata” Roma, Via del Politecnico 1, I-00133, Roma, Italy (literal)
Titolo
  • The influence of oxygen on the optical properties of RF-sputtered zinc oxide thin films (literal)
Abstract
  • In this article, we investigate the effects of oxygen partial pressure in the deposition chamber on the optical properties of zinc oxide (ZnO) thin films; in particular, we examine the variation of the refractive index with oxygen flux. ZnO thin films were deposited by radio-frequency (RF) magnetron sputtering and studied by means of X-ray diffraction (XRD) and spectroscopic ellipsometry (SE). We have found a preferential c-axis growth of ZnO films, with slightly variable deposition rates from 2.6 to 3.8 angstrom/s. Conversely, the refractive index exhibits, from ultraviolet (UV) to near infrared (IR), a considerable and almost linear variation when the oxygen flux value in the deposition chamber varies from 0 to 10 seem. (literal)
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