Effects of Ni catalyst-substrate interaction on carbon nanotubes growth by CVD (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Effects of Ni catalyst-substrate interaction on carbon nanotubes growth by CVD (Articolo in rivista) (literal)

Anno

• 2007-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.physe.2006.09.002 (literal)

Alternative label

• Veronese GP, Rizzoli R, Angelucci R, Cuffiani M, Malferrari L, Montanari A, Odorici F (2007)
  Effects of Ni catalyst-substrate interaction on carbon nanotubes growth by CVD
  in Physica. E, Low-dimensional systems and nanostructures (Print); North Holland Pub. Co., Amsterdam (Paesi Bassi)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Veronese GP, Rizzoli R, Angelucci R, Cuffiani M, Malferrari L, Montanari A, Odorici F (literal)

Pagina inizio

• 21 (literal)

Pagina fine

• 25 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni

• Proceeding paper (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 37 (literal)

Rivista

• Physica. E, Low-dimensional systems and nanostructures (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 5 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Univ Bologna, Dipartimento Fis, I-40127 Bologna, Italy; CNR, IMM, Sez Bologna, I-40129 Bologna, Italy; Univ Bologna, Ist Nazl Fis Nucl, Sez Bologna, I-40127 Bologna, Italy (literal)

Titolo

• Effects of Ni catalyst-substrate interaction on carbon nanotubes growth by CVD (literal)

Abstract

• An investigation of the effects of substrate type and various treatments on carbon nanotubes (CNT) growth, using an evaporated Ni thin film as a catalyst, is presented. Barrier layers Of SiO2, Si3N4, and TiN on Si were used as substrates. The catalyst-insulating substrate systems have been processed in several gaseous atmospheres (Ar, NH3 and H-2) and in the temperature range 700-900 degrees C, in order to obtain the most appropriate morphology, size and density of catalyst particles as seeds for the subsequent CNT growth. On this kind of substrates, the smallest nanoparticles were obtained on SiO2 layers, in H-2 or NH3 atmosphere even at 700 degrees C. However, the best vertically aligned and well-graphitized CNT resulted from the NH3 annealing process, followed by the CNT deposition at 900 degrees C in C2H2 and H-2. On TiN conducting substrates, the best vertically aligned CNT were deposited using a shorter annealing step and a deposition process at reduced pressure. The samples were characterized by means of scanning electron microscopy (SEM) and Raman spectroscopy analysis. (literal)

Editore

• North Holland Pub. Co. (Editore)

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Sintesi e caratterizzazione di materiali nanostrutturati a base di C e Si per applicazioni in sensoristica e nanoelettronica (MD.P05.017.001) (Modulo)

Autore CNR

• RENATO ANGELUCCI (Persona)
• RITA RIZZOLI (Persona)
• Giulio Paolo Veronese (Persona)

Incoming links:

Autore CNR di

• RITA RIZZOLI (Persona)
• RENATO ANGELUCCI (Persona)
• Giulio Paolo Veronese (Persona)

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Sintesi e caratterizzazione di materiali nanostrutturati a base di C e Si per applicazioni in sensoristica e nanoelettronica (MD.P05.017.001) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Physica. E, Low-dimensional systems and nanostructures (Rivista)

Editore di

• North Holland Pub. Co. (Editore)