http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35868
A measurement technique for thermoelectric power of CMOS layers at the wafer level (Articolo in rivista)
- Type
- Label
- A measurement technique for thermoelectric power of CMOS layers at the wafer level (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.sna.2006.03.028 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Mancarella F; Roncaglia A; Cardinali GC (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://www.sciencedirect.com/science/article/pii/S0924424706002706 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- Scopu (literal)
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, IMM Sez Bologna, I-40129 Bologna, Italy (literal)
- Titolo
- A measurement technique for thermoelectric power of CMOS layers at the wafer level (literal)
- Abstract
- We propose a method aimed at executing accurate thermoelectric power measurements at the wafer level on micromachined test structures. In order to compensate for instrumental offsets and sensitivity limits typically existing in a standard wafer-level test instrumentation, a special purpose extraction technique is applied. The influence of air-convection and heating/cooling effects on the measurement is also discussed by carefully evaluating the results of finite-element simulations of heat exchange in the test structure. In order to validate the technique, test measurements on p and n-doped polysilicon layers are presented and compared with other results from the literature. Moreover, the accuracy of the measurement technique and its temperature resolution are discussed. (literal)
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