http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35849
High responsivity 4H-SiC Schottky UV photodiodes based on the pinch-off surface effect (Articolo in rivista)
- Type
- Label
- High responsivity 4H-SiC Schottky UV photodiodes based on the pinch-off surface effect (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.2337861 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Sciuto A; Roccaforte F; Di Franco S; Raineri V; Bonanno G (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, IMM, I-95121 Catania, Italy; Osserv Astrofis Catania, INAF, I-95123 Catania, Italy (literal)
- Titolo
- High responsivity 4H-SiC Schottky UV photodiodes based on the pinch-off surface effect (literal)
- Abstract
- In this letter, high responsivity 4H-SiC vertical Schottky UV photodiodes based on the pinch-off surface effect, obtained by means of self-aligned Ni2Si interdigit contacts, are demonstrated. The diode area was 1 mm(2), with a 37% directly exposed to the radiation. The dark current was about 200 pA at -50 V. Under a 256 nm UV illumination, a current increase of more than two orders of magnitude is observed, resulting in a 78% internal quantum efficiency. The vertical photodiodes showed an ultraviolet-visible rejection ratio > 7x10(3) and a responsivity a factor of about 1.8 higher than a conventional planar metal-semiconductor-metal structure. (literal)
- Prodotto di
- Autore CNR
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi