http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35800
Top-down contact lithography fabrication of a TiO2 nanowire array over a SiO2 mesa (Articolo in rivista)
- Type
- Label
- Top-down contact lithography fabrication of a TiO2 nanowire array over a SiO2 mesa (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1088/0957-4484/17/15/025 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Francioso L, Siciliano P (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, IMM, Sez Lecce, I-73100 Lecce, Italy (literal)
- Titolo
- Top-down contact lithography fabrication of a TiO2 nanowire array over a SiO2 mesa (literal)
- Abstract
- A fast and cheap nanofabrication process for a titania (TiO2) nanostructured nanowire array with a lateral section ranging from 90 to 180 nm and 1.4 mm in length is presented. As an alternative to typical pattern transfer techniques for submicron fabrication, this work focused on a standard 365 nm ultraviolet (UV) photolithographic process that is able to fabricate sol-gel nanostructured titania nanowires from a solid thin film onto a silicon oxide mesa. Useful process parameters like anisotropy and bias have been calculated. Finally, in order to carry out electrical characterization, the TiO2 nanowire-based array was electrically contacted by platinum electrodes and tested with EtOH pulses to validate enhanced gas sensor device performance and to verify electrical conductivity of these nanostructures. (literal)
- Prodotto di
- Autore CNR
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