Micrometric patterning process of sol-gel SnO2, In2O3 and WO3 thin film for gas sensing applications: Towards silicon technology integration (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Micrometric patterning process of sol-gel SnO2, In2O3 and WO3 thin film for gas sensing applications: Towards silicon technology integration (Articolo in rivista) (literal)

Anno

• 2006-01-01T00:00:00+01:00 (literal)

Alternative label

• Francioso L, Russo M, Taurino AM, Siciliano P (2006)
  Micrometric patterning process of sol-gel SnO2, In2O3 and WO3 thin film for gas sensing applications: Towards silicon technology integration
  in Sensors and actuators. B, Chemical (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Francioso L, Russo M, Taurino AM, Siciliano P (literal)

Pagina inizio

• 159 (literal)

Pagina fine

• 166 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 119 (literal)

Rivista

• Sensors and actuators. B, Chemical (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Univ Lecce, IMM, CNR, Unite Lecce, I-73100 Lecce, Italy; Univ Lecce, Dept Engn Innovat, I-73100 Lecce, Italy (literal)

Titolo

• Micrometric patterning process of sol-gel SnO2, In2O3 and WO3 thin film for gas sensing applications: Towards silicon technology integration (literal)

Abstract

• Gas sensors research moves nowadays towards new applications of traditional metal oxide gas sensors into new fields like food quality, security applications and combustion control. Besides an implementation of this kind of transducers requires often a reduction of sensor dimensions, introduction of mature silicon technology substrates and fabrication methods. This work focuses on results obtained about implementation of reliable, selective, subtractive processes to perform high resolution patterning of different metal oxide films, deposited by cheap sol-gel technology onto oxidized silicon wafer or provided with thin layers of sputtered silicon nitride. Main innovations in this paper deal with an experimental evaluation of different methods to perform etching processes for three different sol-gel metal oxide materials deposited on standard dielectric layers, and evaluation of photoresist mask chemical inertness. (literal)

Prodotto di

• Sensori e Microsistemi Intelligenti per la Sicurezza e la Qualità della vita nei settori Agroalimentare, Trasporti ed \"Ambient Assisted Living\" (MD.P05.010.001) (Modulo)
• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• MAURIZIO RUSSO (Persona)
• PIETRO ALEARDO SICILIANO (Unità di personale interno)
• ANTONELLA TAURINO (Unità di personale esterno)
• LUCA NUNZIO FRANCIOSO (Persona)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Sensori e Microsistemi Intelligenti per la Sicurezza e la Qualità della vita nei settori Agroalimentare, Trasporti ed \"Ambient Assisted Living\" (MD.P05.010.001) (Modulo)

Autore CNR di

• PIETRO ALEARDO SICILIANO (Unità di personale interno)
• MAURIZIO RUSSO (Persona)
• LUCA NUNZIO FRANCIOSO (Persona)
• ANTONELLA TAURINO (Unità di personale esterno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Sensors and actuators. B, Chemical (Rivista)