Breakdown kinetics of Pr2O3 films by conductive-atomic force microscopy (Articolo in rivista)

Type
Label
  • Breakdown kinetics of Pr2O3 films by conductive-atomic force microscopy (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2140883 (literal)
Alternative label
  • Fiorenza P., Lo Nigro R., Raineri V., Lombardo S., Toro R.G., Malandrino G., Fragala I.L. (2005)
    Breakdown kinetics of Pr2O3 films by conductive-atomic force microscopy
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Fiorenza P., Lo Nigro R., Raineri V., Lombardo S., Toro R.G., Malandrino G., Fragala I.L. (literal)
Pagina inizio
  • 231913-1 (literal)
Pagina fine
  • 231913-3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 87 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, IMM, I-95127 Catania, Italy; Univ Catania, Dipartimento Sci Chim, I-95125 Catania, Italy; Univ Catania, Dipartimento Sci Chim, I-95125 Catania, Italy (literal)
Titolo
  • Breakdown kinetics of Pr2O3 films by conductive-atomic force microscopy (literal)
Abstract
  • The dielectric breakdown (BD) kinetics of praseodymium thin films has been determined by comparison between current-voltage measurements on large-area (up to 78.54 mu m(2)) metal-oxide-semiconductor structures and conductive-atomic force microscopy (C-AFM). C-AFM clearly images the weak BD single spots under constant voltage stresses. The stress time on the single C-AFM tip dot was varied from 2.5x10(-3) to 8x10(-2) s. The density of BD spots, upon increasing the stress time, exhibits an exponential trend. The Weibull slope and the characteristic time of the dielectric BD have been determined by direct measurements at nanometer scale. (literal)
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