n(+)/p diodes realized in SiC by phosphorus ion implantation: Electrical characterization as a function of temperature (Articolo in rivista)

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  • n(+)/p diodes realized in SiC by phosphorus ion implantation: Electrical characterization as a function of temperature (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.4028/www.scientific.net/MSF.483-485.649 (literal)
Alternative label
  • Canino M., Castaldini A., Cavallini A., Moscatelli F., Nipoti R., Poggi A. (2005)
    n(+)/p diodes realized in SiC by phosphorus ion implantation: Electrical characterization as a function of temperature
    in Materials science forum; TRANS TECH PUBLICATIONS LTD, LAUBLSRUTISTR 24, CH-8717 STAFA-ZURICH (Svizzera)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Canino M., Castaldini A., Cavallini A., Moscatelli F., Nipoti R., Poggi A. (literal)
Pagina inizio
  • 649 (literal)
Pagina fine
  • 652 (literal)
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  • Congresso data AUG 31-SEP 04, 2004 Congresso luogo Bologna, ITALY Congresso nome 5th European Conference on Silicon Carbide and Related Materials Congresso relazione Contributo Congresso rilevanza Internazionale Curatore/i del volume Roberta Nipoti, Antonella Poggi and Andrea Scorzoni Titolo del volume Silicon Carbide and Related Materials 2004 (literal)
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  • http://www.scientific.net/MSF.483-485.649 (literal)
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  • Silicon Carbide and Related Materials 2004 (literal)
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  • 483-485 (literal)
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  • 483-485 (literal)
Rivista
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  • 4 (literal)
Note
  • ISI Web of Science (WOS) (literal)
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  • Univ Bologna, I-40126 Bologna, Italy; CNR, IMM, Sez Bologna, I-40129 Bologna, Italy; Univ Perugia, DIEI, I-06125 Perugia, Italy (literal)
Titolo
  • n(+)/p diodes realized in SiC by phosphorus ion implantation: Electrical characterization as a function of temperature (literal)
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  • Roberta Nipoti, Antonella Poggi and Andrea Scorzoni (literal)
Abstract
  • n+/p diodes have been realized by 300°C phosphorus ion implantation and subsequent annealing at 1300°C. An electrical characterization of the devices as well as a study of the defects introduced by the implantation process has been made. I-V measurements pointed out that the diodes maintain a good rectifying behavior up to 737K. DLTS analyses detected the presence of three traps, T2, T3 and T4, which are not due to the implantation process, and a high energy trap, T5, that could be related to the surface states at the Ni/SiC interface. (literal)
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