Effect of a Ti cap layer on the diffusion of Co atoms during CoSi2 reaction (Articolo in rivista)

Type
Label
  • Effect of a Ti cap layer on the diffusion of Co atoms during CoSi2 reaction (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1149/1.1846717 (literal)
Alternative label
  • Alberti A., Fronterre R., La Via F., Rimini E. (2005)
    Effect of a Ti cap layer on the diffusion of Co atoms during CoSi2 reaction
    in Electrochemical and solid-state letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Alberti A., Fronterre R., La Via F., Rimini E. (literal)
Pagina inizio
  • 47 (literal)
Pagina fine
  • 50 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 8 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR IMM Sez Catania, I-95121 Catania, Italy; Univ Catania, Dipartimento Fis, I-95123 Catania, Italy (literal)
Titolo
  • Effect of a Ti cap layer on the diffusion of Co atoms during CoSi2 reaction (literal)
Abstract
  • Silicide formation in thin cobalt/poly-Si layers capped with Ti during annealing in the temperature range between 420 and 510 oC was investigated by time-resolved sheet resistance measurements. We found that CoSi2 nucleation is a fast process while Co diffusion through CoSi2 grain boundaries is a slow process. Simulations of the resistance curves vs. time have shown that the pre-exponential factor of cobalt diffusivity is reduced by the presence of Ti contamination at the CoSi2 grain boundaries, as it was shown by energy-filtered transmission electron microscopy analyses, whilst the activation energy does not change with respect to a reference. (literal)
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