http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35420
Imaging of Si quantum dots as charge storage nodes (Articolo in rivista)
- Type
- Label
- Imaging of Si quantum dots as charge storage nodes (Articolo in rivista) (literal)
- Anno
- 2003-01-01T00:00:00+01:00 (literal)
- Alternative label
Puglisi R.A., Lombardo S., Ammendola G., Nicotra G., Gerardi C. (2003)
Imaging of Si quantum dots as charge storage nodes
in Materials science & engineering. C, Biomimetic materials, sensors and systems (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Puglisi R.A., Lombardo S., Ammendola G., Nicotra G., Gerardi C. (literal)
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- Rivista
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, Ist Microelettron & Microsistemi, Sez Catania, I-95121 Catania, Italy; STMicroelect, I-95121 Catania, Italy (literal)
- Titolo
- Imaging of Si quantum dots as charge storage nodes (literal)
- Abstract
- Nanoscale structures have been recently proposed as charge storage nodes due to their potential applications for future nanoscale memory devices. Our approach is based on the idea of using Si nanodots as discrete floating gates. To experimentally investigate such potential, we have fabricated MOS structures with Si nanocrystals. The dots have been deposited onto an ultra-thin tunnel oxide by chemical vapor deposition (CVD) of SiH4, and then annealed at 1000 degreesC for 40 s, to crystallize all the dots. After deposition, the dots have been covered by a CVD SiO2 layer, thus resulting completely embedded into stoichiometric silicon oxide. The nanocrystal density and size have been studied by energy filtered TEM (EFTEM) analysis. An electrostatic force microscope has been used to locally inject and image charge. By applying a relatively large tip voltage and reducing the tip to sample separation down to the contact with the surface sample, a few dots have been charged, by appearing as protrusions on the surface. The charged dots have been monitored for up to 30 min, by showing no discharge effects either vertically, through the double barrier of oxide layers, or laterally, via cross talk effect between other close dots. (literal)
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