http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35307
a-Si : H based two-dimensional photonic crystals (Articolo in rivista)
- Type
- Label
- a-Si : H based two-dimensional photonic crystals (Articolo in rivista) (literal)
- Anno
- 2003-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/S1386-9477(02)00668-9 (literal)
- Alternative label
Bennici E., Ferrero S., Giorgis F., Pirri C.F., Rizzoli R., Schina P., Businaro L., Di Fabrizio E. (2003)
a-Si : H based two-dimensional photonic crystals
in Physica. E, Low-dimensional systems and nanostructures (Print); North Holland Pub. Co., Amsterdam (Paesi Bassi)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Bennici E., Ferrero S., Giorgis F., Pirri C.F., Rizzoli R., Schina P., Businaro L., Di Fabrizio E. (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Politecnico di Torino, Dipartimento Fis, INFM, I-10129 Turin, Italy;
CNR, IMM, Sez Bologna, I-40129 Bologna, Italy;
Olivetti 1 Jet SPA, I-11020 Arnad, Aosta, Italy;
INFM, TASC, Elettra Synchrotron Light Source, Lilit Beam Line, I-34012 Trieste, Italy (literal)
- Titolo
- a-Si : H based two-dimensional photonic crystals (literal)
- Abstract
- We describe the fabrication processes of silicon-based two-dimensional photonic crystals (2D-PCs) with a photonic band gap in the near-IR range. The procedures involve electron beam lithography followed by an anisotropic etching step of hydrogenated amorphous silicon thin films deposited by plasma enhanced chemical vapor deposition. Micrometric and submicrometric arrays of cylindrical holes are transferred using a poly-methylmethacrylate resist layer as a mask. A careful comparison between standard parallel plate reactive ion etching and inductively coupled plasma etching techniques is performed, aimed at obtaining periodic structures with high aspect ratio and good profile sharpness. (literal)
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