http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35225
Near-field photocurrent measurements on boron-implanted silicon (Articolo in rivista)
- Type
- Label
- Near-field photocurrent measurements on boron-implanted silicon (Articolo in rivista) (literal)
- Anno
- 2002-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.1446654 (literal)
- Alternative label
Marocchi V., Cricenti A., Perfetti P., Chiaradia P., Raineri V., Spinella C. (2002)
Near-field photocurrent measurements on boron-implanted silicon
in Journal of applied physics
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Marocchi V., Cricenti A., Perfetti P., Chiaradia P., Raineri V., Spinella C. (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- [ 2 ]CNR, Ist Struttura Mat, I-00133 Rome, Italy
[ 2 ] Univ Roma Tor Vergata, Dipartimento Fis, I-00133 Rome, Italy
[ 3 ] Univ Roma Tor Vergata, INFM, I-00133 Rome, Italy
[ 4 ] CNR, IMETEM, I-95121 Catania, Italy (literal)
- Titolo
- Near-field photocurrent measurements on boron-implanted silicon (literal)
- Abstract
- We report near-field photocurrent (NPC) measurements performed on three boron-implanted silicon samples characterized by different implantation
doses. The images were acquired at lambda=1330 nm corresponding to a photon energy of 0.93 eV which is smaller than the silicon energy gap (Egap=1.12
eV), representing incident radiation to which silicon is virtually transparent. The NPC images reveal the presence of boron clusters which are
a consequence of B implantation and rapid thermal annealing at 1100 °C for 30 s. Boron clusters behave as metal clusters embedded into the silicon
matrix and introduce gap states which give rise to the observed photocurrent. (literal)
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- Autore CNR
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