Near-field photocurrent measurements on boron-implanted silicon (Articolo in rivista)

Type
Label
  • Near-field photocurrent measurements on boron-implanted silicon (Articolo in rivista) (literal)
Anno
  • 2002-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.1446654 (literal)
Alternative label
  • Marocchi V., Cricenti A., Perfetti P., Chiaradia P., Raineri V., Spinella C. (2002)
    Near-field photocurrent measurements on boron-implanted silicon
    in Journal of applied physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Marocchi V., Cricenti A., Perfetti P., Chiaradia P., Raineri V., Spinella C. (literal)
Pagina inizio
  • 3937 (literal)
Pagina fine
  • 3939 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 91 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [ 2 ]CNR, Ist Struttura Mat, I-00133 Rome, Italy [ 2 ] Univ Roma Tor Vergata, Dipartimento Fis, I-00133 Rome, Italy [ 3 ] Univ Roma Tor Vergata, INFM, I-00133 Rome, Italy [ 4 ] CNR, IMETEM, I-95121 Catania, Italy (literal)
Titolo
  • Near-field photocurrent measurements on boron-implanted silicon (literal)
Abstract
  • We report near-field photocurrent (NPC) measurements performed on three boron-implanted silicon samples characterized by different implantation doses. The images were acquired at lambda=1330 nm corresponding to a photon energy of 0.93 eV which is smaller than the silicon energy gap (Egap=1.12 eV), representing incident radiation to which silicon is virtually transparent. The NPC images reveal the presence of boron clusters which are a consequence of B implantation and rapid thermal annealing at 1100 °C for 30 s. Boron clusters behave as metal clusters embedded into the silicon matrix and introduce gap states which give rise to the observed photocurrent. (literal)
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