http://www.cnr.it/ontology/cnr/individuo/prodotto/ID35184
Electroluminescence of silicon nanocrystals in MOS structures (Articolo in rivista)
- Type
- Label
- Electroluminescence of silicon nanocrystals in MOS structures (Articolo in rivista) (literal)
- Anno
- 2002-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1007/s003390101019 (literal)
- Alternative label
G. Franzò, A. Irrera, E. Ceretta Moreira, M. Miritello, F. Iacona, D. Sanfilippo, G. Di Stefano, P.G. Fallica, and F. Priolo (2002)
Electroluminescence of silicon nanocrystals in MOS structures
in Applied physics. A, Materials science & processing (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- G. Franzò, A. Irrera, E. Ceretta Moreira, M. Miritello, F. Iacona, D. Sanfilippo, G. Di Stefano, P.G. Fallica, and F. Priolo (literal)
- Pagina inizio
- Pagina fine
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- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Univ Catania, INFM, Corso Italia 57, I-95129 Catania, Italy.
Univ Catania, Dipartimento Fis, I-95129 Catania, Italy
CNR, IMETEM, I-95121 Catania, Italy
STMicroelectronics, I-95121 Catania, Italy (literal)
- Titolo
- Electroluminescence of silicon nanocrystals in MOS structures (literal)
- Abstract
- We have studied the structural, electrical and optical properties of MOS
devices, where the dielectric layer consists of a substoichiometric SiOx (x
< 2) thin film deposited by plasma-enhanced chemical vapor deposition.
After deposition the samples were annealed at high temperature (> 1000 °C)
to induce the separation of the Si and the SiO2 phases with the formation
of Si nanocrystals embedded in the insulating matrix. We observed at room
temperature a quite intense electroluminescence (EL) signal with a peak
at about 850 nm. The EL peak position is very similar to that observed in
photoluminescence in the very same device, demonstrating that the observed
EL is due to electron-hole recombination in the Si nanocrystals and not to
defects. The effects of the Si concentration in the SiOx layer and of the
annealing temperature on the electrical and optical properties of these
devices are also reported and discussed. In particular, it is shown that by
increasing the Si content in the SiOx layer the operating voltage of the
device decreases and the total efficiency of emission increases. These data
are reported and their implications discussed. (literal)
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