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Charge states distribution of 0.16-3.3 mev He ions transmitted through silicon (Articolo in rivista)
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- Label
- Charge states distribution of 0.16-3.3 mev He ions transmitted through silicon (Articolo in rivista) (literal)
- Anno
- 2002-01-01T00:00:00+01:00 (literal)
- Alternative label
Bianconi M., Bentini G. G., Lotti R., Nipoti R. (2002)
Charge states distribution of 0.16-3.3 mev He ions transmitted through silicon
in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)
(literal)
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- Bianconi M., Bentini G. G., Lotti R., Nipoti R. (literal)
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- CNR- Istituto LAMEL (literal)
- Titolo
- Charge states distribution of 0.16-3.3 mev He ions transmitted through silicon (literal)
- Abstract
- The equilibrium charge state distribution of He ions transmitted through
silicon in a random direction was measured in the energy range 0.16-3.3
MeV. The surface contamination, investigated by back-scattering
spectrometry, amounted to a few monolayers. The measured data, integrated
with the available literature points, cover a wide range of conditions.
At the lower end (velocity about 1 a.u.) there is a consistent fraction of
neutral He and the process is strongly influenced by solid state e.ects; at
the higher end (velocity about 6 a.u.) most of the ions are stripped and
the process can be described by individual He-Si collisions. The use of a
semi-classical approach, based on the early theory of Bohr, allows for a
satisfactory description of the Heþ/He2+ ratio in the whole energy range. (literal)
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