Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges (Articolo in rivista)

Type
Label
  • Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges (Articolo in rivista) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Alternative label
  • Anna Maria Coclite, Antonella Milella, Fabio Palumbo, Francesco Fracassi and Riccardo d'Agostino (2010)
    Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges
    in Plasma processes and polymers (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Anna Maria Coclite, Antonella Milella, Fabio Palumbo, Francesco Fracassi and Riccardo d'Agostino (literal)
Pagina inizio
  • 1022 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 7 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Dipartimento di Chimica, Universita' di bari CNR-Istituto di Metodologie Inorgnaiche e dei Plasmi (literal)
Titolo
  • Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges (literal)
Prodotto di
Autore CNR

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