http://www.cnr.it/ontology/cnr/individuo/prodotto/ID34556
Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges (Articolo in rivista)
- Type
- Label
- Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges (Articolo in rivista) (literal)
- Anno
- 2010-01-01T00:00:00+01:00 (literal)
- Alternative label
Anna Maria Coclite, Antonella Milella, Fabio Palumbo, Francesco Fracassi and Riccardo d'Agostino (2010)
Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges
in Plasma processes and polymers (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Anna Maria Coclite, Antonella Milella, Fabio Palumbo, Francesco Fracassi and Riccardo d'Agostino (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Dipartimento di Chimica, Universita' di bari
CNR-Istituto di Metodologie Inorgnaiche e dei Plasmi (literal)
- Titolo
- Chemical and Morphological Characterization of Low-k Dielectric Films Deposited From Hexamethyldisiloxane and Ethylene RF Glow Discharges (literal)
- Prodotto di
- Autore CNR
Incoming links:
- Prodotto
- Autore CNR di
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi