Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection (Articolo in rivista) (literal)

Anno

• 2010-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1002/ppap.201000017 (literal)

Alternative label

• Anna Maria Coclite; Antonella Milella; Fabio Palumbo; Christophe Le Pen; Riccardo d'Agostino (2010)
  Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection
  in Plasma processes and polymers (Print); WILEY-V C H VERLAG GMBH, WEINHEIM (Germania)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Anna Maria Coclite; Antonella Milella; Fabio Palumbo; Christophe Le Pen; Riccardo d'Agostino (literal)

Pagina inizio

• 802 (literal)

Pagina fine

• 802 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 7 (literal)

Rivista

• Plasma processes and polymers (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 812 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 9-10 (literal)

Note

• Scopu (literal)
• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Istituto di Metodologie Inorganiche e dei Plasmi - CNR, Bari, Italy Dipartimento di Chimica, Universita` degli Studi di Bari, Italy ArcelorMittal Liege Research Boulevard de Colonster B57 Liege, Belgium Plasma Solution, Spin off of the University of Bari, Italy (literal)

Titolo

• Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection (literal)

Abstract

• The alternated deposition of silicon oxide and organosilicon layers, yielding to ultra-barrier films against the transmission of vapors and gases through plastic substrates, has been demonstrated to be also an effective tool for the deposition of highly corrosion protective coatings on low-carbon steel substrate. PECVD is really efficient for the deposition of multilayered stacks since it allows the deposition of the organosilicon and silicon oxide layers in the same process chamber and using the same precursor, the tetraethoxysilane. The multilayer approach leads to 600-nm-thick coatings with high corrosion resistance (1.1 x 10(7) Omega cm(2)), while a layer of SiO(x) has the same protective effectiveness only for thickness greater than 1 mu m. The use of modulated discharges for the multilayer deposition exhibits an improved resistance to corrosion by two orders of magnitude with respect to continuous mode. (literal)

Editore

• WILEY-V C H VERLAG GMBH (Editore)

Prodotto di

• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)
• Istituto di Nanotecnologia (NANOTEC) (Istituto)

Autore CNR

• ANTONELLA MILELLA (Persona)
• RICCARDO D'AGOSTINO (Persona)
• FABIO PALUMBO (Persona)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR di

• FABIO PALUMBO (Persona)
• RICCARDO D'AGOSTINO (Persona)
• ANTONELLA MILELLA (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Plasma processes and polymers (Rivista)

Editore di

• WILEY-V C H VERLAG GMBH (Editore)