http://www.cnr.it/ontology/cnr/individuo/prodotto/ID34456
Recent Advances in the Atmospheric Pressure PE-CVD of Fluorocarbon Films: Influence of Air and Water Vapour Impurities (Articolo in rivista)
- Type
- Label
- Recent Advances in the Atmospheric Pressure PE-CVD of Fluorocarbon Films: Influence of Air and Water Vapour Impurities (Articolo in rivista) (literal)
- Anno
- 2009-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1002/ppap.200931107 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Fiorenza Fanelli; Giovanni Di Renzo; Francesco Fracassi;
Riccardo d'Agostino (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Dipartimento di Chimica, Universita` degli Studi di Bari-IMIP CNR,
via Orabona 4, 70126 Bari, Italy (literal)
- Titolo
- Recent Advances in the Atmospheric Pressure PE-CVD of Fluorocarbon Films: Influence of Air and Water Vapour Impurities (literal)
- Abstract
- The influence of air and water vapour on the deposition process of fluoropolymers in argonhexafluoropropene
(Ar-C3F6) filamentary dielectric barrier discharges was investigated by
adding known concentrations of these contaminants to the feed gas. The obtained results
show that Ar-C3F6 DBDs allow in depositing thin films with a XPS F/C ratio as high as 1.7. Under
the experimental conditions investigated, contaminant addition slightly affects the F/C ratio
of the coatings, and does not cause appreciable O- and N-uptake, but induces a decrease of the
deposition rate. Preliminary results from the OES investigation of the gas phase and the GC-MS
analysis of the gas effluent are also reported. (literal)
- Prodotto di
- Autore CNR
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