http://www.cnr.it/ontology/cnr/individuo/prodotto/ID34393
InAs(100) Surfaces Cleaning by an As-Free Low-Temperature 100 degrees C Treatment (Articolo in rivista)
- Type
- Label
- InAs(100) Surfaces Cleaning by an As-Free Low-Temperature 100 degrees C Treatment (Articolo in rivista) (literal)
- Anno
- 2009-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1149/1.3076194 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- M. Losurdo; M.M. Giangregorio; F. Lisco; P. Capezzuto; G. Bruno; D.S. Wolter; M. Angelo; A. Brown (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, Inst Inorgan Methodol & Plasmas, IMIP, I-70126 Bari, Italy
Duke Univ, Dept Elect & Comp Engn, Durham, NC 27708 USA (literal)
- Titolo
- InAs(100) Surfaces Cleaning by an As-Free Low-Temperature 100 degrees C Treatment (literal)
- Abstract
- Abstract: Oxide removal from InAs(100) surfaces was achieved using a combination of HF:methanol wet etching followed by atomic hydrogen treatment at a temperature as low as 100 degrees C without any stabilizing As flux. The process was monitored in real-time exploiting spectroscopic ellipsometry. Following this treatment, the surface morphology was found to be very smooth at the nanometer scale, with a reduced effective oxide thickness and no appreciable levels of elemental In and As. Furthermore, we demonstrate stability of such surfaces against oxide reformation. (literal)
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- Autore CNR
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