http://www.cnr.it/ontology/cnr/individuo/prodotto/ID34328
Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas (Articolo in rivista)
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- Label
- Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas (Articolo in rivista) (literal)
- Anno
- 2004-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1002/ppap.200400021 (literal)
- Alternative label
A. Milella, F. Palumbo, P. Favia, G. Cicala, R. dAgostino (2004)
Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas
in Plasma processes and polymers (Print)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- A. Milella, F. Palumbo, P. Favia, G. Cicala, R. dAgostino (literal)
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- Titolo
- Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas (literal)
- Abstract
- Continuous and modulated c-C4F8 (perfluorocyclobutane) plasmas were used to deposit thin Teflon-like films. Gas phase and film composition and structure were investigated and the results can be rationalized with the deposition mechanism developed in a previous work for
C2F4-modulated plasmas. The effect of modulation on the morphology and the chemistry of the surface were studied. CFx percentages as a function of the duty cycle for films deposited for 90 min from modulated discharges sustained at 100 W, 300 mtorr, and 6 sccm. (literal)
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