Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas (Articolo in rivista)

Type
Label
  • Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas (Articolo in rivista) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1002/ppap.200400021 (literal)
Alternative label
  • A. Milella, F. Palumbo, P. Favia, G. Cicala, R. d’Agostino (2004)
    Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas
    in Plasma processes and polymers (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A. Milella, F. Palumbo, P. Favia, G. Cicala, R. d’Agostino (literal)
Pagina inizio
  • 164 (literal)
Pagina fine
  • 170 (literal)
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  • 1 (literal)
Rivista
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  • 7 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • IMIP (literal)
Titolo
  • Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas (literal)
Abstract
  • Continuous and modulated c-C4F8 (perfluorocyclobutane) plasmas were used to deposit thin Teflon-like films. Gas phase and film composition and structure were investigated and the results can be rationalized with the deposition mechanism developed in a previous work for C2F4-modulated plasmas. The effect of modulation on the morphology and the chemistry of the surface were studied. CFx percentages as a function of the duty cycle for films deposited for 90 min from modulated discharges sustained at 100 W, 300 mtorr, and 6 sccm. (literal)
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