Role of growth temperature on nanostructure and field emission properties of PLD thin carbon films (Articolo in rivista)

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  • Role of growth temperature on nanostructure and field emission properties of PLD thin carbon films (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1007/s00339-008-4715-8 (literal)
Alternative label
  • C. Scilletta1; S. Orlando2; M. Servidori3; E. Cappelli1; G. Conte4; P. Ascarelli1 (2008)
    Role of growth temperature on nanostructure and field emission properties of PLD thin carbon films
    in Applied physics. A, Materials science & processing (Print); Springer, New York (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • C. Scilletta1; S. Orlando2; M. Servidori3; E. Cappelli1; G. Conte4; P. Ascarelli1 (literal)
Pagina inizio
  • 783 (literal)
Pagina fine
  • 787 (literal)
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  • 93 (literal)
Rivista
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  • 5 (literal)
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  • 3 (literal)
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  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 CNR-ISC, Montelibretti, via Salaria Km 29.3, P.O.B. 10, 00016 Monterotondo, Rome, Italy 2 CNR-IMIP, Potenza, 85050 Tito Scalo, Potenza, Italy 3 CNR-IMM, Bologna, Via P. Gobetti 101, 40129 Bologna, Italy 4 Department of Electronic Engineering and CNISM, University of Rome \"Roma Tre\", Via della Vasca Navale 84, 00146 Rome, Italy (literal)
Titolo
  • Role of growth temperature on nanostructure and field emission properties of PLD thin carbon films (literal)
Abstract
  • Thin carbon films have been deposited in vacuum (~10-4 Pa) on Si substrates by pulsed laser ablation of a graphite target using a Nd:YAG laser operating in the near infrared region (? = 1064 nm). The samples have been deposited at different substrate temperatures (T sub) ranging from room temperature (RT) to 800°C. X-ray diffraction analysis established the progressive formation of nanosized graphene structures as T sub increased. In fact, film structure evolves from almost amorphous to nanostructured phase characterized by graphene layers oriented perpendicularly to the film plane. The film density, evaluated by X-ray reflectivity measurements, is strongly affected by T sub. At RT the film density is similar to the graphite one, while it decreases at higher T sub. The electrical properties of the samples have been characterized by field emission measurements. The parameters describing the emitter properties (threshold field Eth and field enhancement factor ?) have been evaluated using variable anode-to-cathode distance method. Samples deposited at low T sub have shown the best emission properties, presenting lower Eth and larger ? values than those deposited at higher T sub. This is mainly attributed to the sensible density variation, which is in competition with the slighter augment of mean nanoparticle size. (literal)
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