Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry (Articolo in rivista) (literal)

Anno

• 2005-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1063/1.1899758 (literal)

Alternative label

• M. Losurdo, M. Giangregorio, P. Capezzuto, G. Bruno, F. Giorgis (2005)
  Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry
  in Journal of applied physics
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• M. Losurdo, M. Giangregorio, P. Capezzuto, G. Bruno, F. Giorgis (literal)

Pagina inizio

• 103504 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 97 (literal)

Rivista

• Journal of applied physics (Rivista)

Note

• Scopu (literal)
• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR-IMIP (literal)

Titolo

• Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry (literal)

Abstract

• Amorphous (a-Si(1-x)C(x): H) and microcrystalline (mu c-Si(1-x)C(x): H) thin films have been deposited by plasma-enhanced chemical-vapor deposition using SiF(4)-CH(4)-H(2) rf plasmas. Gas flow rates have been varied to deposit films with different carbon content and microstructure. The microstructure and optical properties have been investigated by IR/Raman spectroscopy and by spectroscopic ellipsometry in the energy range of 1.5-5.0 eV. Ellipsometric spectra have been analyzed in terms of the tetrahedron model combined with the Bruggeman effective-medium approximation to determine the film microstructure and silicon-carbon-bond configurations. Correlation between Si-C bond configurations and optical properties of films has been studied as a function of carbon content and microstructure. It is found that the optical properties and the band gap value depend not only on the carbon content, but also on the Si-C bond configuration and microcrystallinity. The films consist of Si-centered Si-Si(4-v)C(v) (v=0-3) Si-centered tetrahedra with segregation of mu c-Si. The amorphous matrix changes from Si-Si(3)C to Si-SiC(3) with the increase of the mu c-Si phase. The optical gap is found to increase with both carbon content and microcrystallinity. (literal)

Prodotto di

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR

• MARIA MICHELA GIANGREGORIO (Persona)
• MARIA LOSURDO (Unità di personale interno)
• GIOVANNI BRUNO (Unità di personale interno)

Insieme di parole chiave

• Parole chiave di "Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR di

• GIOVANNI BRUNO (Unità di personale interno)
• MARIA LOSURDO (Unità di personale interno)
• MARIA MICHELA GIANGREGORIO (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of applied physics (Rivista)

Insieme di parole chiave di

• Parole chiave di "Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry" (Insieme di parole chiave)