Plasma-Assisted MOCVD Growth of ZnO Thin Films (Articolo in rivista)

Type
Label
  • Plasma-Assisted MOCVD Growth of ZnO Thin Films (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • M.Losurdo, M. M. Giangregorio, P. Capezzuto, G. Bruno G. Malandrino, M. Blandino, I.L. Fragal (2006)
    Plasma-Assisted MOCVD Growth of ZnO Thin Films
    in Materials Research Society symposia proceedings
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M.Losurdo, M. M. Giangregorio, P. Capezzuto, G. Bruno G. Malandrino, M. Blandino, I.L. Fragal (literal)
Pagina inizio
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 892 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, IMIP, Inst Inorgan Methodol & Plasmas, Via Orabona,4, I-70126 Bari, Italy. (literal)
Titolo
  • Plasma-Assisted MOCVD Growth of ZnO Thin Films (literal)
Abstract
  • ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) also plasma assisted (PA-MOCVD) on c-axis oriented sapphire (0001) and Si(001) substrates using the alternative Zn(TTA)2.tmed (HTTA=2-thenoyltrifluoroacetone,TMED=N,N,N',N'-tetramethylethylendiamine) precursor. The structural, morphological and optical properties of ZnO films have been investigated. The results show that the O-2 plasma assisted growth results in an improvement of the structure, in smoother morphologies and in a better optical quality with a sharp and intense exciton of ZnO films. (literal)
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