http://www.cnr.it/ontology/cnr/individuo/prodotto/ID33822

Nanostructure and Composition Control of Fluorocarbon Films from Modulated Tetrafluoroethylene Plasmas. (Articolo in rivista)

Type

Articolo in rivista (Classe)
Prodotto della ricerca (Classe)

Label

Nanostructure and Composition Control of Fluorocarbon Films from Modulated Tetrafluoroethylene Plasmas. (Articolo in rivista) (literal)

Anno

2002-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

10.1021/ma025536e (literal)

Alternative label

Cicala G., Milella A., Palumbo F., Rossini P., Favia P., D'Agostino R. (2002)
Nanostructure and Composition Control of Fluorocarbon Films from Modulated Tetrafluoroethylene Plasmas.
in Macromolecules (Print)
(literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

Cicala G., Milella A., Palumbo F., Rossini P., Favia P., D'Agostino R. (literal)

Pagina inizio

8920 (literal)

Pagina fine

8922 (literal)

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The experimental work described in this paper has been reported in several conference lectures, where a lot of interest and curiosity has been stimulated in the scientific community. Impact factor: 4.539 (literal)

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35 (literal)

Rivista

Macromolecules (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

3 (literal)

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24 (literal)

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The investigation on C2F4 fed plasmas has led to the deposition of coatings with a unique morphological structure. This is the first time a ribbon-like morphology is reported for fluorocarbon coatings, deposited in a one step process. Modulation of the plasma is a key for producing this kind of coatings. The transition from flat, amorphous coatings to structured ,crystalline ones is possible when duty cycle is lower than 7%. (literal)

Note

Scopu (literal)
ISI Web of Science (WOS) (literal)

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Cicala G., Palumbo F.: CNR IMIP Rossini P., Favia P., D'Agostino R.Milella A.: Università di Bari (literal)

Titolo

Nanostructure and Composition Control of Fluorocarbon Films from Modulated Tetrafluoroethylene Plasmas. (literal)

Abstract

To study plasma enhanced chem. vapor deposition (PECVD) of tetrafluoroethylene under modulated discharge (MD) conditions, the effect of the duty cycle (DC) on the time-resolved CF2* emitting species in MD C2F4 plasmas and on the compn. and morphol. of the deposited CFx films was examd. PECVD conditions (substrate: cryst. silicon) were kept const. with respect to power (30 W), pressure (300 mTorr), substrate temp. (room temp.), C2F4 flow rate (6 sccm), and deposition time (90 min) but were varied with respect to modulation parameters period (20-200 ms, only 100 ms period results are reported in the article) and DC (2-100%). The chem. compn., the crystallinity, and the morphol. of the deposited fluorocarbon films were detd. by FT-IR and XPS as well as x-ray diffractometry and SEM. Data of plasma phase and results of film characterization are presented and discussed. The ratios of the CFx fractions (i.e., CF3, CF2, CF, C-CF, and C-C) and the F/C ratio were detd. for various DCs. A decrease in DC from 100% (= continuous wave (CW) condition) to 5% increased CF2 fraction from 29.84 to 62.33% and simultaneously decreased all other fractions. F/C ratio also increased (1.40/100% to 1.90/5%). Under MD plasma conditions, the film structure became more ordered and from the compositional point of view led to structure retention, and linear PTFE chains were obtained. A transition from amorphous (CW condition) to cryst. morphol. depending strongly from DC value was obsd. The results are kinetically and mechanistically discussed. The modulation of C2F4 plasmas was a useful tool to control the kinetics of the heterogeneous reaction of CF2 species and to shift it by tuning the DC values. (literal)

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