On the use and limits of mass spectrometry for the characterization of fluorocarbon emission during plasma processing (Articolo in rivista)

Type
Label
  • On the use and limits of mass spectrometry for the characterization of fluorocarbon emission during plasma processing (Articolo in rivista) (literal)
Anno
  • 2002-01-01T00:00:00+01:00 (literal)
Alternative label
  • Fracassi F., D'Agostino R., Illuzzi F. (2002)
    On the use and limits of mass spectrometry for the characterization of fluorocarbon emission during plasma processing
    in Journal of the Electrochemical Society
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Fracassi F., D'Agostino R., Illuzzi F. (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 149 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Bari, Dipartmento Chim, CNR, Ctr Studio Chim Plasmi, Bari, Italy (literal)
Titolo
  • On the use and limits of mass spectrometry for the characterization of fluorocarbon emission during plasma processing (literal)
Abstract
  • This paper deals with the quadrupole mass spectrometric evaluation of fluoro-compd. emissions during plasma processing. A crit. discussion of the anal. procedure including the estn. of quantification limits, detection limits, and t-Student test, is reported. The use of pos. and neg. chem. ionization as the ionization source to reduce the interference due to peak overlapping is also examd. (literal)
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