Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures (Comunicazione a convegno)

Type
Label
  • Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures (Comunicazione a convegno) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Alternative label
  • Sofia Gaiaschi, R Ruggeri, EV Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, Pavel Bulkin, P Chapon, G Mannino, Jean-Paul Kleider (2013)
    Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures
    in ICANS 25, Toronto, Canada, Aug 2013
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Sofia Gaiaschi, R Ruggeri, EV Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, Pavel Bulkin, P Chapon, G Mannino, Jean-Paul Kleider (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • SCM - Equipe Semiconducteurs en Couches Minces LGEP - Laboratoire de génie électrique de Paris CNR - IMM Catania (literal)
Titolo
  • Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures (literal)
Prodotto di
Autore CNR

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Prodotto
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