In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications (Articolo in rivista) (literal)

Anno

• 2014-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.tsf.2014.06.009 (literal)

Alternative label

• Mrázková, Zuzana; Torres Rios, A.; Ruggeri, Rosa; Foldyna, Martin F.; Postava, Kamil P.; Pi?tora, Jaromír P.; Roca I Cabarrocas, Pere (2014)
  In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications
  in Thin solid films (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Mrázková, Zuzana; Torres Rios, A.; Ruggeri, Rosa; Foldyna, Martin F.; Postava, Kamil P.; Pi?tora, Jaromír P.; Roca I Cabarrocas, Pere (literal)

Pagina inizio

• 749 (literal)

Pagina fine

• 755 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://www.scopus.com/record/display.url?eid=2-s2.0-84920707821&origin=inward (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 571 (literal)

Rivista

• Thin solid films (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• P3 (literal)

Note

• Scopu (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Ecole Polytechnique; Vysoká ?kola bá?ská - Technická univerzita Ostrava; Consiglio Nazionale delle Ricerche (literal)

Titolo

• In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications (literal)

Abstract

• Crystallinity and material quality of hydrogenated microcrystalline silicon (?c-Si:H) films change during their growth, leading to a complex material structure. In order to identify the composition of those inhomogeneous films, deposited on iron-nickel (Fe-Ni) alloy substrates, in-situ ellipsometric data were taken during the thin film growth at regular time intervals. The analysis of the in-situ data taken at the photon energy range between 2.8 and 4.5 eV allowed us to identify the composition of the thin film surface as it grows. The time evolution of the crystalline and amorphous silicon fractions and the surface roughness shows clearly three important phases of the thin film growth: the initial growth of nanocone shaped crystals, the collision phase of neighboring crystals, and the semi-homogeneous material growth until the end of the deposition. The analysis of in-situ data taken during depositions on three different Fe-Ni alloy substrates with different crystal sizes and surface textures shows significant differences in the crystalline silicon fraction of deposited films. The proposed method provides the means to analyze the growth process on flexible Fe-Ni alloy substrates and to optimize the quality of deposited ?c-Si:H films by finding the most suitable Fe-Ni substrates. (literal)

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Materiali e processi avanzati per celle fotovoltaiche (MD.P05.005.004) (Modulo)

Autore CNR

• Rosa Ruggeri (Persona)

Insieme di parole chiave

• Keywords of "In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications" (Insieme di parole chiave)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Materiali e processi avanzati per celle fotovoltaiche (MD.P05.005.004) (Modulo)

Autore CNR di

• Rosa Ruggeri (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Thin solid films (Rivista)

Insieme di parole chiave di

• Keywords of "In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications" (Insieme di parole chiave)