http://www.cnr.it/ontology/cnr/individuo/prodotto/ID32683
Multilayer coatings for x-ray mirrors: extraction of stack parameters from x-ray reflectivity scans and comparison with transmission electron microscopy results (Articolo in rivista)
- Type
- Label
- Multilayer coatings for x-ray mirrors: extraction of stack parameters from x-ray reflectivity scans and comparison with transmission electron microscopy results (Articolo in rivista) (literal)
- Anno
- 2007-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1117/1.2769325 (literal)
- Alternative label
Spiga D., Pareschi G., Cotroneo V., Canestrari R., Vernani D., Mirone A., Ferrero C., Ferrari C., Lazzarini L. (2007)
Multilayer coatings for x-ray mirrors: extraction of stack parameters from x-ray reflectivity scans and comparison with transmission electron microscopy results
in Optical engineering (Bellingham, Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Spiga D., Pareschi G., Cotroneo V., Canestrari R., Vernani D., Mirone A., Ferrero C., Ferrari C., Lazzarini L. (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- INAF Osservatorio Astronom Brera, I-23807 Merate, LC, Italy;
European Synchrotron Radiat Facil, F-38043 Grenoble, France;
CNR, IMEM, I-43010 Parma, Italy (literal)
- Titolo
- Multilayer coatings for x-ray mirrors: extraction of stack parameters from x-ray reflectivity scans and comparison with transmission electron microscopy results (literal)
- Abstract
- The reflectance effectiveness of a multilayer depends strongly on the stack properties (thickness, roughness, and density of each layer) and can be directly tested by means of x-ray reflectivity scans at definite photon energies. The reflectivity curves are also a powerful tool for the in-depth, nondestructive characterization of the stack structure: The complex task of extracting the stack parameters from reflectivity curves can be achieved via a suitable best-fitting computer code based on a global automatic optimization procedure. We present the computer-assisted layer-by-layer analysis of the characteristics of Ni/C, Pt/C, and W/Si multilayers, based on x-ray reflectivity scans performed at 8.05 and 17.45 keV. In order to verify the correctness of the code predictions, we present also a comparison of the computer model with the transmission electron microscope profiles of the same multilayer samples. (literal)
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