Internal gettering efficiency in p/p+ and p/p- silicon epistructures (Contributo in atti di convegno)

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Label
  • Internal gettering efficiency in p/p+ and p/p- silicon epistructures (Contributo in atti di convegno) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.4028/www.scientific.net/SSP.95-96.593 (literal)
Alternative label
  • Frigeri C.1, Borionetti G.2, Godio P.2, Gombia E.1 (2004)
    Internal gettering efficiency in p/p+ and p/p- silicon epistructures
    in 10th Meeting on Gettering and Defect Engineering in Semiconductor Technology: GADEST 03, Berlin-Zeuthen (D), 21-26 Sett. 2003
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Frigeri C.1, Borionetti G.2, Godio P.2, Gombia E.1 (literal)
Pagina inizio
  • 593 (literal)
Pagina fine
  • 598 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • Conference: 10th International Autumn Meeting on Gettering and Defect Engineering in Semiconductor Technology (GADEST 2003) Location: BERLIN, GERMANY Date: SEP 21-26, 2003 Sponsor(s): IHP Frankfurt; IHP BTU Joint Lab; European Mat Res Soc (literal)
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  • http://www.scientific.net/SSP.95-96.593 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume
  • Gettering and Defect Engineering in Semiconductor Technology X (literal)
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  • 95-96 (literal)
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  • 95-96 (literal)
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Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1CNR-IMEM, PArma, Italy; 2MEMC Electronic Materials, Novara, Italy (literal)
Titolo
  • Internal gettering efficiency in p/p+ and p/p- silicon epistructures (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 3-908450-82-9 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#curatoriVolume
  • H. Richter and M. Kittler (literal)
Abstract
  • The efficiency of internal gettering vs. external and p(+) gettering has been investigated by EBIC contrast measurements in p/p(+) and p/p(-) epi Si on Cz substrates containing oxygen precipitates. The samples were not intentionally contaminated. It was seen that internal gettering also works in presence of back-side poly Si and high B concentration (p/p+ samples with high oxygen content and back-side poly Si) because of, on one hand, the high density of oxygen precipitates and, on the other hand, the low onset temperature for p(+) gettering. The metal undergoing internal gettering likely is Fe, though present in concentrations as low as 10(9)-10(10) cm(-3). (literal)
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