Fabrication at Wafer Level of Micromachined Gas Sensors Based on Sn02 Nanorods Deposited by PECVD and Gas Sensing Characteristics (Contributo in atti di convegno)

Type
Label
  • Fabrication at Wafer Level of Micromachined Gas Sensors Based on Sn02 Nanorods Deposited by PECVD and Gas Sensing Characteristics (Contributo in atti di convegno) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1109/IWASI.2011.6004716 (literal)
Alternative label
  • A. Forleo, L. Francioso, S. Capone, F. Casino, P. Siciliano, H. Huang, O.K. Tan (2011)
    Fabrication at Wafer Level of Micromachined Gas Sensors Based on Sn02 Nanorods Deposited by PECVD and Gas Sensing Characteristics
    in 4th IEEE International Workshop on Advances in Sensors and Interfaces (IWASI), 2011, Savelletri di Fasano (Italy), 28-29 June 2011
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A. Forleo, L. Francioso, S. Capone, F. Casino, P. Siciliano, H. Huang, O.K. Tan (literal)
Pagina inizio
  • 196 (literal)
Pagina fine
  • 198 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • Article number 6004716, e-ISBN: 978-145770622-6, Print-ISBN: 978-1-4577-0623-3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume
  • Proc. of 4th IEEE International Workshop on Advances in Sensors and Interfaces (IWASI), 2011 (literal)
Note
  • Scopus (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • - Consiglio Nazionale delle Ricerche - lstituto per la Microelettronica ed i Microsistemi, (C.N.R.-I.M.M.),via Monteroni, 1-73100 Lecce, Italy - Sensors and Actuators Lab, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore (literal)
Titolo
  • Fabrication at Wafer Level of Micromachined Gas Sensors Based on Sn02 Nanorods Deposited by PECVD and Gas Sensing Characteristics (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 978-1-4577-0623-3 (literal)
Abstract
  • Sn02 nanorods were successfully deposited on 3\" Si/Si02 wafers by inductively coupled plasma-enhanced chemical vapor deposition (PECVD) and a wafer-level patterning of nanorods layer for miniaturized solid state gas sensor fabrication were performed. Uniform needle-shape Sn02 nanorods in situ grown were obtained under catalyst- and high temperature treatment-free growth condition. These nanorods have an average diameter between 5 and IS nm and a length of 160 to 300 nm. The Sn02-nanords based gas sensors were tested towards NH3 and CH30H and gas sensing tests show remarkable response, showing promising and repeatable results compared with the Sn02 thin films gas sensors. (literal)
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