http://www.cnr.it/ontology/cnr/individuo/prodotto/ID322637
Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (Articolo in rivista)
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- Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (Articolo in rivista) (literal)
- Anno
- 2015-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1117/1.OE.54.3.035101 (literal)
- Alternative label
Zdenko Zápra?ný
Du?an Korytár
Matej Jergel
Peter ?iffalovic?
Edmund Dobroc?ka
Patrik Vagovic?
Claudio Ferrari
Petr Mikulík
Maksym Demydenko
Marek Miklo?ka (2015)
Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology
in Optical engineering (Bellingham, Print); SPIE-INT SOC OPTICAL ENGINEERING, BELLINGHAM, WA 98227-0010 (Stati Uniti d'America)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Zdenko Zápra?ný
Du?an Korytár
Matej Jergel
Peter ?iffalovic?
Edmund Dobroc?ka
Patrik Vagovic?
Claudio Ferrari
Petr Mikulík
Maksym Demydenko
Marek Miklo?ka (literal)
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- Slovak Academy of Sciences, Institute of Electrical Engineering, Dúbravská cesta 9, 845 11 Bratislava, Slovakia
Slovak Academy of Sciences, Institute of Physics, Dúbravská cesta 9, 845 11 Bratislava, Slovakia
DESY, Center for Free-Electron Laser Science, Notkestrasse 85, 226 07 Hamburg, Germany
CNR-IMEM Institute, Parco Area delle Scienze 37/A, 431 24 Parma, Italy
Masaryk University, Central European Institute of Technology, Kotlá?ska 2, 611 37 Brno, Czech Republic
Sumy State University, R.-Korsakov Str. 2, 40007 Sumy, Ukraine
Integra TDS, s.r.o., Pod Párovcami 4757/25, 921 01 Pie?t'any, Slovakia (literal)
- Titolo
- Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (literal)
- Abstract
- We present the numerical optimization and the technological development progress of x-ray optics
based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties
of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry
factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric
monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several
crystal surface finishing methods, including advanced nanomachining using single-point diamond turning
(SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have
evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and
others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes
surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness
down to 0.1 nm. The smallest roughness (~0.3 nm), best planarity, and absence of the subsurface damage
were observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was
consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles
(20 nm) (literal)
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