Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (Articolo in rivista)

Type
Label
  • Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (Articolo in rivista) (literal)
Anno
  • 2015-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1117/1.OE.54.3.035101 (literal)
Alternative label
  • Zdenko Zápra?ný Du?an Korytár Matej Jergel Peter ?iffalovic? Edmund Dobroc?ka Patrik Vagovic? Claudio Ferrari Petr Mikulík Maksym Demydenko Marek Miklo?ka (2015)
    Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology
    in Optical engineering (Bellingham, Print); SPIE-INT SOC OPTICAL ENGINEERING, BELLINGHAM, WA 98227-0010 (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Zdenko Zápra?ný Du?an Korytár Matej Jergel Peter ?iffalovic? Edmund Dobroc?ka Patrik Vagovic? Claudio Ferrari Petr Mikulík Maksym Demydenko Marek Miklo?ka (literal)
Pagina inizio
  • 035101-1 (literal)
Pagina fine
  • 035101-12 (literal)
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  • 54 (literal)
Rivista
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  • 12 (literal)
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  • 3 (literal)
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  • Slovak Academy of Sciences, Institute of Electrical Engineering, Dúbravská cesta 9, 845 11 Bratislava, Slovakia Slovak Academy of Sciences, Institute of Physics, Dúbravská cesta 9, 845 11 Bratislava, Slovakia DESY, Center for Free-Electron Laser Science, Notkestrasse 85, 226 07 Hamburg, Germany CNR-IMEM Institute, Parco Area delle Scienze 37/A, 431 24 Parma, Italy Masaryk University, Central European Institute of Technology, Kotlá?ska 2, 611 37 Brno, Czech Republic Sumy State University, R.-Korsakov Str. 2, 40007 Sumy, Ukraine Integra TDS, s.r.o., Pod Párovcami 4757/25, 921 01 Pie?t'any, Slovakia (literal)
Titolo
  • Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (literal)
Abstract
  • We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (~0.3 nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles (20 nm) (literal)
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